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公开(公告)号：US20080087541A1
公开(公告)日：2008-04-17
申请号：US11665563
申请日：2005-10-11
IPC分类号： H01J37/34
CPC分类号： H01J37/3435 , H01J37/3405
摘要： An end-block for electrically energising a rotatable tubular target in a vacuum coating installation is disclosed. The end-block has a rotary electrical contact that reduces the joule heating effects when operating in alternating current mode. When compared to known end-blocks, this is achieved by increasing the number of contact areas between a contacting ring and a series of circumferentially mounted contacting shoes. Also the contact shoes are being pressed radially outwardly by means of resilient elements against the contacting ring.
摘要翻译： 公开了一种用于对真空涂覆装置中的可旋转管状靶进行电激励的端块。 端块具有旋转电接触，可在交流模式下工作时减少焦耳加热效应。 当与已知的端块相比时，这通过增加接触环和一系列周向安装的接触鞋之间的接触面积的数量来实现。 此外，接触鞋被抵靠接触环的弹性元件径向向外挤压。
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公开(公告)号：US07824528B2
公开(公告)日：2010-11-02
申请号：US11665563
申请日：2005-10-11
CPC分类号： H01J37/3435 , H01J37/3405
摘要： An end-block for electrically energising a rotatable tubular target in a vacuum coating installation is disclosed. The end-block has a rotary electrical contact that reduces the joule heating effects when operating in alternating current mode. When compared to known end-blocks, this is achieved by increasing the number of contact areas between a contacting ring and a series of circumferentially mounted contacting shoes. Also the contact shoes are being pressed radially outwardly by means of resilient elements against the contacting ring.
摘要翻译： 公开了一种用于对真空涂覆装置中的可旋转管状靶进行电激励的端块。 端块具有旋转电接触，可在交流模式下工作时减少焦耳加热效应。 当与已知的端块相比时，这通过增加接触环和一系列周向安装的接触鞋之间的接触面积的数量来实现。 此外，接触鞋被抵靠接触环的弹性元件径向向外挤压。
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公开(公告)号：US20080202925A1
公开(公告)日：2008-08-28
申请号：US11908017
申请日：2006-02-23
IPC分类号： C23C14/00
CPC分类号： C23C14/3407 , H01J37/3405 , H01J37/3497
摘要： A single, right-angled end-block is claimed for rotatably carrying a target in a sputtering apparatus. The end-block comprises all necessary means to drive, energise, bear and seal (coolant and gas) the target in the sputtering apparatus from the outside through a single opening in a wall or door. The right-angled end-block rotates the target around an axis of rotation that is parallel to the wall on which the target is mounted. By preference the end-block is situated below the target in order to allow easy drainage of the coolant.
摘要翻译： 要求用于在溅射装置中可旋转地携带目标的单个直角端块。 端块包括通过壁或门中的单个开口从外部驱动，激励，承载和密封（冷却剂和气体）溅射装置中的靶的所有必要装置。 直角端块围绕围绕安装目标的墙壁的旋转轴旋转目标。 优选地，端块位于目标下方，以便容易地排出冷却剂。
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公开(公告)号：US08562799B2
公开(公告)日：2013-10-22
申请号：US11665562
申请日：2005-10-11
CPC分类号： C23C14/3407 , H01J37/3435
摘要： An end-block for use in a tubular magnetron sputtering apparatus is disclosed. Such an end-block rotatably transfers movement, coolant 5 and electrical current to the target while maintaining vacuum integrity and a closed coolant circuit. It hence comprises a drive means, a rotary electrical contact means, a bearing means, a number of rotary coolant seal means and a number of vacuum seal means. The inventive end-block occupies a minimal axial length along the target thus allowing 10 space savings in existing equipment such as e.g. display coaters. The axial length is reduced by mounting at least two of the means radial to one another.
摘要翻译： 公开了一种用于管状磁控溅射装置的端块。 这种端块可以将运动，冷却剂5和电流转移到目标物上，同时保持真空完整性和封闭的冷却剂回路。 因此，它包括驱动装置，旋转电接触装置，轴承装置，多个旋转冷却剂密封装置和多个真空密封装置。 本发明的端块沿着目标占据最小的轴向长度，从而允许现有设备中的10个空间节省，例如， 显示涂布机 通过将至少两个装置相对于彼此径向地安装来减小轴向长度。
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公开(公告)号：US20080105543A1
公开(公告)日：2008-05-08
申请号：US11665562
申请日：2005-10-11
IPC分类号： C23C14/50
CPC分类号： C23C14/3407 , H01J37/3435
摘要： An end-block for use in a tubular magnetron sputtering apparatus is disclosed. Such an end-block rotatably transfers movement, coolant 5 and electrical current to the target while maintaining vacuum integrity and a closed coolant circuit. It hence comprises a drive means, a rotary electrical contact means, a bearing means, a number of rotary coolant seal means and a number of vacuum seal means. The inventive end-block occupies a minimal axial length along the target thus allowing 10 space savings in existing equipment such as e.g. display coaters. The axial length is reduced by mounting at least two of the means radial to one another.
摘要翻译： 公开了一种用于管状磁控溅射装置的端块。 这种端块可以将运动，冷却剂5和电流转移到目标物上，同时保持真空完整性和封闭的冷却剂回路。 因此，它包括驱动装置，旋转电接触装置，轴承装置，多个旋转冷却剂密封装置和多个真空密封装置。 本发明的端块沿着目标占据最小的轴向长度，从而允许现有设备中的10个空间节省，例如， 显示涂布机 通过将至少两个装置相对于彼此径向地安装来减小轴向长度。
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公开(公告)号：US09394603B2
公开(公告)日：2016-07-19
申请号：US13885905
申请日：2011-11-17
申请人： Wilmert De Bosscher
发明人： Wilmert De Bosscher
CPC分类号： C23C14/352 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A sputtering method and apparatus having at least one set of dual rotatable cylindrical sputtering targets mounted in a vacuum chamber. Magnet assemblies in hollow target cylinders provide erosion zones running long the parallel sides of a racetrack that act as target flux sources towards a substrate. These parallel erosion zones have a highly concentrated plasma density for rapid sputtering of the target and any reactive material. Features include the angular distance between normals to adjacent parallel erosion zones, the angle greater than 45° subtended at the center of the cylindrical target, placement of the substrate with respect to the targets, and pointing angles (orientation or tilt) of the racetracks toward the substrate and/or each other. These parameters form a relatively wide and efficient constant flux deposition region at the substrate, and allows for high deposition rates at constant reactive gas partial pressures with substantially uniform film stoichiometry and thickness.
摘要翻译： 一种溅射方法和装置，其具有安装在真空室中的至少一组双旋转圆柱形溅射靶。 空心目标圆柱体中的磁体组件提供腐蚀区域，该区域作为朝向基板的目标通量源的跑道的平行侧延伸。 这些平行侵蚀区域具有高浓度的等离子体密度，用于目标物和任何反应性材料的快速溅射。 特征包括法向与相邻平行侵蚀区域之间的角距离，在圆柱形目标的中心处对角度大于45°的角度，相对于目标物放置基板，以及将跑道的指向角度（取向或倾斜）朝向 基板和/或彼此。 这些参数在衬底上形成相对宽且有效的恒定焊剂沉积区域，并且在具有基本均匀的膜化学计量和厚度的恒定反应气体分压下允许高沉积速率。
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公开(公告)号：US09082595B2
公开(公告)日：2015-07-14
申请号：US12293891
申请日：2007-03-14
CPC分类号： H01J37/3405 , C23C14/34 , C23C14/56 , H01J37/3447
摘要： A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.
摘要翻译： 揭示了一种涂布设备，其被设计成通过物理真空沉积工艺或化学真空沉积工艺或其组合来涂覆基底。 所述涂覆装置的特征在于它使用可旋转的磁控管（14），该磁控管可利用轴向可移动的挡板（18）覆盖。 这种布置使得能够在磁控管目标之间或在随后的涂覆步骤之间或之后保持目标清洁或清洁目标。 闸门还提供了目标附近的可控气体气氛。 描述了磁控管中心放置的布置。 然后通过将衬底悬挂在围绕磁控管的行星转盘（24）上将衬底从各个角度暴露于溅射源。
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公开(公告)号：US07927700B2
公开(公告)日：2011-04-19
申请号：US10565265
申请日：2004-07-01
IPC分类号： B32B9/00
CPC分类号： F16C33/14 , C23C16/0272 , C23C16/26 , C23C28/322 , C23C28/34 , C23C28/341 , C23C28/343 , C23C28/347 , C23C28/36 , F16C2223/60 , Y10T428/30
摘要： The invention relates to a substrate covered at least partially with a layered coating. The layered coating comprises an intermediate coating and a hard carbon coating. The intermediate coating comprises a first metal layer deposited on the substrate, the first metal layer comprising at least one element of group IVB, group VB or group VIB; a nitride layer deposited on the first metal layer, the nitride layer comprising at least one nitride of an element of group IVB, group VB or group VIB; a second metal layer deposited on the nitride layer, the second metal layer comprising at least one element of group IVB, group VB or group VIB; a transition layer deposited on the second metal layer, the transition layer comprising at least one carbide of an element of group IVB, group VB or group VIB.
摘要翻译： 本发明涉及至少部分地覆盖有层状涂层的基底。 分层涂层包括中间涂层和硬碳涂层。 中间涂层包括沉积在基底上的第一金属层，第一金属层包含IVB族，VB族或VIB族的至少一种元素; 沉积在第一金属层上的氮化物层，所述氮化物层包含至少一种IVB族，VB族或VIB族元素的氮化物; 沉积在氮化物层上的第二金属层，第二金属层包含IVB族，VB族或VIB族的至少一种元素; 沉积在第二金属层上的过渡层，所述过渡层包含至少一种第IVB族，VB族或VIB族元素的碳化物。
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公开(公告)号：US07563488B2
公开(公告)日：2009-07-21
申请号：US10486650
申请日：2002-07-10
CPC分类号： C23C4/18 , C23C2/26 , C23C14/3414 , C23C26/00 , Y02T50/67
摘要： The invention relates to a process for manufacturing a sputter target. The process comprises the steps of—providing a target holder (12); —applying an intermediate layer (14) on said target holder; —applying a top layer (16) on top of said intermediate layer; said top layer comprising a material having a melting point which is substantially higher than the melting point of said target material; —heating the target holder coated with said intermediate layer and said top layer.
摘要翻译： 本发明涉及溅射靶的制造方法。 该方法包括以下步骤：提供目标支架（12）; 在所述目标支架上施加中间层（14）; 在所述中间层的顶部上施加顶层（16）; 所述顶层包含熔点远高于所述目标材料的熔点的材料; - 加热涂覆有所述中间层和所述顶层的靶架。
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公开(公告)号：US20080012337A1
公开(公告)日：2008-01-17
申请号：US11611470
申请日：2006-12-15
IPC分类号： F16L23/00
CPC分类号： F16L23/08 , F16L21/06 , F16L37/08 , H01J37/3405
摘要： The invention relates to a vacuum sputter reactor comprising a rotatable vacuum tight coupling. The coupling comprises a first tubular section in the form of a spindle, and a second tubular section in the form of a cylindrical target, axially slidable over the first tubular section to abut against a peripheral outer abutment ring. The coupling further comprising at least one sealing ring located between the outer diameter of the first tubular section and the inner diameter of the second tubular section in a sliding overlapping contact area of the first and second tubular sections. The outer diameter of the first tubular section is generally parallel to the opposing surface of the inner wall of the second tubular section from the sealing ring to the end of the first tubular section. The coupling further comprising a clamping ring with a substantially cylindrical outer surface in order to place cylindrical shields closely to the clamping ring, the clamping ring being composed of clamping elements, each clamp element having a semi-circular or U-shaped cross-section with an inwardly oriented recess. The recess encloses the abutment ring and a flange extremity on the second tubular section, and the recess cooperating with the flange extremity to positively, solidly and axially clamp the abutment ring against the flange extremity. The clamp elements are fixed to each other at their extremities with fixing means comprising in at least one place on the clamping ring bolting means, the axis of which is perpendicular to the longitudinal axis of the coupled tubular sections and substantially tangential to the clamping ring periphery.
摘要翻译： 本发明涉及一种真空溅射反应器，其包括可旋转的真空密封联接器。 联接器包括主轴形式的第一管状部分和圆柱形目标形式的第二管状部分，其可在第一管状部分上轴向滑动以抵靠外周的邻接环。 联接器还包括位于第一管状部分的外径和第二管状部分的内径之间的至少一个密封环，其位于第一和第二管状部分的滑动重叠接触区域中。 第一管状部分的外径通常平行于第二管状部分的内壁从密封环到第一管状部分的端部的相对表面。 联接器还包括具有基本上圆柱形外表面的夹紧环，以便将圆柱形屏蔽件紧靠于夹紧环，夹紧环由夹紧元件组成，每个夹紧元件具有半圆形或U形横截面， 一个向内的凹槽。 所述凹部围绕所述邻接环并且在所述第二管状部分上具有凸缘末端，并且所述凹部与所述凸缘末端配合以使所述邻接环牢固且轴向地夹紧所述凸缘末端。 夹紧元件在其端部彼此固定，固定装置包括在夹紧环螺栓连接装置的至少一个位置，其轴线垂直于联接的管状部分的纵向轴线并且基本上与夹紧环周边相切 。
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