发明授权
- 专利标题： Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus
- 专利标题（中）： 排气系统和排气泵连接到基板处理装置的处理室
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申请号： US12347349申请日： 2008-12-31
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公开(公告)号： US07837432B2公开(公告)日： 2010-11-23
- 发明人: Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato
- 申请人： Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2005-058108 20050302; JP2005-310545 20051025; JP2005-344663 20051129; JP2006-005344 20060112
- 主分类号： F01D1/36
- IPC分类号： F01D1/36
摘要：
An exhausting system and an exhausting pump connected to a processing chamber of a substrate processing apparatus are provided. The exhausting pump is provided with at least one rotary blade and a cylindrical intake part disposed at the processing chamber side from the rotary blade. The exhausting pump includes a reflecting device disposed inside the intake part and having at least one reflecting surface oriented to the rotary blade.
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