摘要:
An exhausting system and an exhausting pump connected to a processing chamber of a substrate processing apparatus are provided. The exhausting pump is provided with at least one rotary blade and a cylindrical intake part disposed at the processing chamber side from the rotary blade. The exhausting pump includes a reflecting device disposed inside the intake part and having at least one reflecting surface oriented to the rotary blade.
摘要:
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要:
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要:
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要:
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
摘要:
An exhausting system and an exhausting pump connected to a processing chamber of a substrate processing apparatus are provided. The exhausting pump is provided with at least one rotary blade and a cylindrical intake part disposed at the processing chamber side from the rotary blade. The exhausting pump includes a reflecting device disposed inside the intake part and having at least one reflecting surface oriented to the rotary blade.
摘要:
Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment. A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIb of the Periodic Table coated directed or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
摘要:
Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment.A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIa of the Periodic Table coated directly or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
摘要:
A configuration is provided wherein usage restrictions of an application are determined in accordance with timestamps. A certificate revocation list (CRL) in which the revocation information of a content owner who is a providing entity of an application program recorded in a disc is recorded is referred to verify whether or not a content owner identifier recorded in an application certificate is included in the CRL, and in the case that the content owner identifier is included in the CRL, comparison between a timestamp stored in a content certificate and a CRL timestamp is executed, and in the case that the content certificate timestamp has date data equal to or later than the CRL timestamp, utilization processing of the application program is prohibited or restricted. According to the present configuration, a configuration is realized wherein an unrevoked application is not subjected to utilization restriction, and only a revoked application is subjected to utilization restriction.
摘要:
The present invention relates to an information processing device, an information processing method, and a program, which allow an author to handle regarding a video plane to store a video image, which is a storage region where two images worth of storage regions of an L region to store an image for the left eye, and an R region to store an image for the right eye are collaterally disposed, only one of the L region and the R region. Of an API for L to set the size and position of an image to be stored in the L region, and an API for R to set the size and position of an image to be stored in the R region, one API sets the same size and same position as the size and position of said image set by the other API. Also, a graphics plane offset value and a PG offset value are subjected to scaling with a scaling ratio of an image to be stored in the video plane. The present invention may be applied to a BD player for playing a BD, or the like.