Invention Grant
- Patent Title: Device having a contacting structure
- Patent Title (中): 具有接触结构的装置
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Application No.: US11728900Application Date: 2007-03-27
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Publication No.: US07855451B2Publication Date: 2010-12-21
- Inventor: Norbert Seliger , Karl Weidner , Jörg Zapf
- Applicant: Norbert Seliger , Karl Weidner , Jörg Zapf
- Applicant Address: DE Munich
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE Munich
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L23/12 ; H01L23/14

Abstract:
A layer of electrically insulating material is applied to a substrate and a component located thereon, in such a way that said layer follows the surface contours.
Public/Granted literature
- US20070216025A1 Device having a contacting structure Public/Granted day:2007-09-20
Information query
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