发明授权
US07871490B2 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
有权
具有并联天线阵列的电感耦合等离子体发生系统具有均匀分布的功率输入和接地节点，并改善了现场分布
- 专利标题： Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution
- 专利标题（中）： 具有并联天线阵列的电感耦合等离子体发生系统具有均匀分布的功率输入和接地节点，并改善了现场分布
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申请号： US11338085申请日： 2006-01-24
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公开(公告)号： US07871490B2公开(公告)日： 2011-01-18
- 发明人: Harqkyun Kim , Yunju Ra
- 申请人： Harqkyun Kim , Yunju Ra
- 申请人地址： KR Gumi-si, Gyeongsangbuk-do
- 专利权人： Top Engineering Co., Ltd.
- 当前专利权人： Top Engineering Co., Ltd.
- 当前专利权人地址： KR Gumi-si, Gyeongsangbuk-do
- 代理机构： KED & Associates, LLP
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H01L21/306
摘要：
An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving electromagnetic energy into the antenna and output terminals for grounding. In the illustrative embodiment, the antenna has three radiating elements connected in parallel. Each radiating element is a conductor wound in a circular shape with the same diameter. Each radiating element is connected to the input terminal on one end and an output terminal on the other. The input terminal of the second element is 120° rotated counterclockwise from the first and the input terminal of the third is rotated by 120° counterclockwise from the second. The ground terminals of each radiating elements are located in the same manner as the input terminals. Each element is feed by a feeder coil. While the antenna elements are disposed around a chamber, the feeder coils are disposed above the chamber to improved the distribution of electromagnetic energy within the chamber.
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