发明授权
US07881010B2 Process for self-aligned flare point and shield throat definition prior to main pole patterning
有权
在主极图案化之前,自对准耀斑和屏蔽喉定义的过程
- 专利标题: Process for self-aligned flare point and shield throat definition prior to main pole patterning
- 专利标题(中): 在主极图案化之前,自对准耀斑和屏蔽喉定义的过程
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申请号: US11956277申请日: 2007-12-13
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公开(公告)号: US07881010B2公开(公告)日: 2011-02-01
- 发明人: Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
- 申请人: Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 代理机构: Zilka-Kotab, PC
- 主分类号: G11B5/187
- IPC分类号: G11B5/187
摘要:
A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
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