Invention Grant
US07923200B2 Composition for coating over a photoresist pattern comprising a lactam
有权
用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物
- Patent Title: Composition for coating over a photoresist pattern comprising a lactam
- Patent Title (中): 用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物
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Application No.: US11697804Application Date: 2007-04-09
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Publication No.: US07923200B2Publication Date: 2011-04-12
- Inventor: Muthiah Thiyagarajan , Ralph R. Dammel , Yi Cao , SungEun Hong , WenBing Kang , Clement Anyadiegwu
- Applicant: Muthiah Thiyagarajan , Ralph R. Dammel , Yi Cao , SungEun Hong , WenBing Kang , Clement Anyadiegwu
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Sangya Jain
- Main IPC: G03F7/40
- IPC: G03F7/40
Abstract:
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
Public/Granted literature
- US20080248427A1 Composition for Coating over a Photoresist Pattern Comprising a Lactam Public/Granted day:2008-10-09
Information query
IPC分类:
