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    ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
    8.
    发明申请
    ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF 有权
    抗反射涂料组合物及其工艺

    公开(公告)号：US20140370444A1

    公开(公告)日：2014-12-18

    申请号：US13917022

    申请日：2013-06-13

    Applicant: M. Dalil RAHMAN ,  Clement ANYADIEGWU ,  Douglas MCKENZIE ,  Takanori KUDO ,  Elizabeth WOLFER ,  Salem K. MULLEN

    Inventor： M. Dalil RAHMAN ,  Clement ANYADIEGWU ,  Douglas MCKENZIE ,  Takanori KUDO ,  Elizabeth WOLFER ,  Salem K. MULLEN

    IPC: G03F7/09 ,  C09D165/00

    CPC classification number: G03F7/091 ,  C08G2261/314 ,  C08G2261/3424 ,  C09D5/006 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/30

    Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

    Abstract translation: 本发明涉及一种包含新型聚合物的吸收性硬掩模抗反射涂料组合物，其中新型聚合物在聚合物的主链中包含四个重复单元-A-， - B - ， - C-和-D-，其中A为 重复单元在其骨架中包含稠合芳环，B具有结构（1），C是结构（2）的羟基联苯，D是结构式（3）的衍生化芴，其中R 1是C 1 -C 4烷基，R 2是 C 1 -C 4烷基，R 3和R 4独立地为氢或C 1 -C 4烷基，Ar'和Ar“独立地为亚苯基或萘衍生部分，R 5和R 6独立地为-OH或-CH 2）n OH，其中n = 并且R 7和R 8独立地为氢或C 1 -C 4烷基。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。

    Composition for Coating over a Photoresist Pattern Comprising a Lactam
    10.
    发明申请
    Composition for Coating over a Photoresist Pattern Comprising a Lactam 有权
    用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物

    公开(公告)号：US20080248427A1

    公开(公告)日：2008-10-09

    申请号：US11697804

    申请日：2007-04-09

    Applicant: Muthiah Thiyagarajan ,  Ralph R. Dammel ,  Yi Cao ,  SungEun Hong ,  WenBing Kang ,  Clement Anyadiegwu

    Inventor： Muthiah Thiyagarajan ,  Ralph R. Dammel ,  Yi Cao ,  SungEun Hong ,  WenBing Kang ,  Clement Anyadiegwu

    IPC: G03C1/00

    CPC classification number: G03F7/40 ,  C09D139/00

    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

    Abstract translation: 本发明涉及一种用于涂覆光致抗蚀剂图案的水性涂料组合物，其包含含有结构（1）的内酰胺基团的聚合物，其中R 1独立地选自氢，C 1〜 C 1 -C 4烷基，C 1 -C 6烷基醇，羟基（OH），胺（NH 2） ），羧酸和酰胺（CONH 2 2），表示与聚合物的连接，m = 1-6，n = 1-4。 本发明还涉及一种用于制造微电子器件的方法，包括提供具有光致抗蚀剂图案的基底，用新颖的涂层材料涂覆光致抗蚀剂图案，使一部分涂料与光致抗蚀剂图案接触，并且将一部分 不与去除溶液反应的涂料。

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