发明授权
US07923200B2 Composition for coating over a photoresist pattern comprising a lactam
有权
用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物
- 专利标题： Composition for coating over a photoresist pattern comprising a lactam
- 专利标题（中）： 用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物
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申请号： US11697804申请日： 2007-04-09
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公开(公告)号： US07923200B2公开(公告)日： 2011-04-12
- 发明人: Muthiah Thiyagarajan , Ralph R. Dammel , Yi Cao , SungEun Hong , WenBing Kang , Clement Anyadiegwu
- 申请人： Muthiah Thiyagarajan , Ralph R. Dammel , Yi Cao , SungEun Hong , WenBing Kang , Clement Anyadiegwu
- 申请人地址： US NJ Somerville
- 专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人地址： US NJ Somerville
- 代理商 Sangya Jain
- 主分类号： G03F7/40
- IPC分类号： G03F7/40
摘要：
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
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