发明授权
- 专利标题： Rotatable device for holding a substrate
- 专利标题（中）： 用于保持基板的可旋转装置
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申请号： US11718572申请日： 2005-11-03
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公开(公告)号： US07950347B2公开(公告)日： 2011-05-31
- 发明人: Katrin Weilermann , Karl-Josef Kramer
- 申请人： Katrin Weilermann , Karl-Josef Kramer
- 申请人地址： DE Garching
- 专利权人： Suss Microtec Lithography, GmbH
- 当前专利权人： Suss Microtec Lithography, GmbH
- 当前专利权人地址： DE Garching
- 代理机构： AKC Patents LLC
- 代理商 Aliki K. Collins
- 优先权： DE102004053139 20041103
- 国际申请： PCT/EP2005/011776 WO 20051103
- 国际公布： WO2006/048287 WO 20060511
- 主分类号： B05C13/00
- IPC分类号： B05C13/00 ; B05C11/02 ; B05B13/02
摘要：
The invention provides a rotatable and optionally heatable device for holding a flat substrate. The device includes a supporting means for placing and holding the substrate on a supporting surface, optionally a heater, a means for rotating the supporting means and a means for applying a fluid, e.g. a solvent, onto the side of the substrate facing the supporting surface. The fluid is applied when the supporting device for supporting and holding the substrate is caused to rotate.
公开/授权文献
- US20090000544A1 Rotatable Device for Holding a Substrate 公开/授权日：2009-01-01
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