Invention Grant
- Patent Title: Gallium electroplating methods and electrolytes employing mixed solvents
- Patent Title (中): 镓电镀方法和采用混合溶剂的电解质
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Application No.: US12267488Application Date: 2008-11-07
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Publication No.: US07951280B2Publication Date: 2011-05-31
- Inventor: Jiaxiong Wang , Serdar Aksu , Bulent M. Basol
- Applicant: Jiaxiong Wang , Serdar Aksu , Bulent M. Basol
- Applicant Address: US CA San Jose
- Assignee: SoloPower, Inc.
- Current Assignee: SoloPower, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Pillsbury WInthrop Shaw Pittman LLP
- Main IPC: C25D3/00
- IPC: C25D3/00 ; C25D5/10 ; C23C28/02 ; C23C28/00 ; C23C16/40

Abstract:
An electrochemical deposition method and electrolyte to plate uniform, defect free and smooth gallium films are provided. In a preferred embodiment, the electrolyte may include a solvent that comprises water and at least one monohydroxyl alcohol, a gallium salt, and an acid to control the solution pH and conductivity. The method electrodeposits a gallium film possessing sub-micron thickness on a conductive surface. Such gallium layers are used in fabrication of semiconductor and electronic devices such as thin film solar cells.
Public/Granted literature
- US20100116678A1 GALLIUM ELECTROPLATING METHODS AND ELECTROLYTES EMPLOYING MIXED SOLVENTS Public/Granted day:2010-05-13
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