发明授权
- 专利标题: Method for imprint lithography at constant temperature
- 专利标题(中): 恒温压印光刻方法
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申请号: US11579540申请日: 2004-11-25
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公开(公告)号: US07972553B2公开(公告)日: 2011-07-05
- 发明人: Marc Beck , Babak Heidari , Erik Bolmsjö , Erik Theander
- 申请人: Marc Beck , Babak Heidari , Erik Bolmsjö , Erik Theander
- 申请人地址: SE Malmo
- 专利权人: Obducat AB
- 当前专利权人: Obducat AB
- 当前专利权人地址: SE Malmo
- 代理机构: Renner, Otto, Boisselle & Sklar, LLP
- 优先权: EP04445057 20040507
- 国际申请: PCT/EP2004/053106 WO 20041125
- 国际公布: WO2005/109095 WO 20051117
- 主分类号: B29C35/02
- IPC分类号: B29C35/02 ; B29C35/08
摘要:
Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.
公开/授权文献
- US20070164487A1 Method for imprint lithography at constant temperature 公开/授权日:2007-07-19
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