发明授权
- 专利标题: Sterilization method and plasma sterilization apparatus
- 专利标题(中): 灭菌方法和等离子灭菌装置
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申请号: US12087583申请日: 2007-01-11
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公开(公告)号: US08012415B2公开(公告)日: 2011-09-06
- 发明人: Yasushi Hanada , Nobuya Hayashi
- 申请人: Yasushi Hanada , Nobuya Hayashi
- 申请人地址: JP Osaka JP Saga
- 专利权人: Elk Corporation,Saga University
- 当前专利权人: Elk Corporation,Saga University
- 当前专利权人地址: JP Osaka JP Saga
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2006-004166 20060111
- 国际申请: PCT/JP2007/050205 WO 20070111
- 国际公布: WO2007/080907 WO 20070719
- 主分类号: A61L2/20
- IPC分类号: A61L2/20 ; A61L2/00 ; A61L2/18 ; A61L9/00 ; B01J7/00
摘要:
An object to be sterilized is disposed inside a vacuum chamber, and the inside of the vacuum chamber is evacuated. When the pressure inside the vacuum chamber reaches 3 Pa, a cutoff valve disposed between the vacuum chamber and the vacuum pump is closed. High-frequency power is supplied to an electrode. Oxygen gas is introduced into the vacuum chamber for 0.1 sec. Thereafter, the pressure is held constant for 3 sec. Until the pressure inside the vacuum chamber reaches 10 kPa, introduction of oxygen gas into the vacuum chamber is repeated. When the pressure reaches 10 kPa, the cutoff valve is opened to evacuate the inside of the vacuum chamber and the supply of the high-frequency power is stopped. Introducing the oxygen gas and determining pressure inside the vacuum chamber is repeated, and after 90 min, the pressure inside the vacuum chamber is returned to atmospheric pressure.
公开/授权文献
- US20090053101A1 Sterilization Method and Plasma Sterilization Apparatus 公开/授权日:2009-02-26
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