发明授权
US08035149B2 Nonvolatile memory devices with oblique charge storage regions and methods of forming the same
失效
具有倾斜电荷存储区域的非易失性存储器件及其形成方法
- 专利标题: Nonvolatile memory devices with oblique charge storage regions and methods of forming the same
- 专利标题(中): 具有倾斜电荷存储区域的非易失性存储器件及其形成方法
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申请号: US12913865申请日: 2010-10-28
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公开(公告)号: US08035149B2公开(公告)日: 2011-10-11
- 发明人: Woon-Kyung Lee
- 申请人: Woon-Kyung Lee
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec
- 优先权: KR10-2006-0023197 20060313
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
A nonvolatile memory device includes an active region defined by a device isolation layer in a semiconductor substrate, a word line passing over the active region and a charge storage region defined by a crossing of the active region and the word line and disposed between the active region and the word line. The charge storage region is disposed at an oblique angle with respect to the word line.
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