Invention Grant
US08045138B2 Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus
有权
支撑板，具有支撑板的曝光装置，以及使用曝光装置的装置制造方法
- Patent Title: Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus
- Patent Title (中): 支撑板，具有支撑板的曝光装置，以及使用曝光装置的装置制造方法
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Application No.: US12198719Application Date: 2008-08-26
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Publication No.: US08045138B2Publication Date: 2011-10-25
- Inventor: Makoto Ogusu
- Applicant: Makoto Ogusu
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2007-219920 20070827
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.
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