Invention Grant
- Patent Title: Thin film transistor substrate and a fabricating method thereof
- Patent Title (中): 薄膜晶体管基板及其制造方法
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Application No.: US12502653Application Date: 2009-07-14
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Publication No.: US08097881B2Publication Date: 2012-01-17
- Inventor: Young-Wook Lee , Hong-Suk Yoo , Jean-Ho Song , Jae-Hyoung Youn , Jong-In Kim
- Applicant: Young-Wook Lee , Hong-Suk Yoo , Jean-Ho Song , Jae-Hyoung Youn , Jong-In Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2008-0076813 20080806
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/04 ; H01L31/036 ; H01L27/01 ; H01L27/12

Abstract:
An oxide semiconductor thin film transistor substrate includes a gate line and a gate electrode disposed on an insulating substrate, an oxide semiconductor pattern disposed adjacent to the gate electrode, a data line electrically insulated from the gate line, the data line and the gate line defining a display region, a first opening exposing a surface of the data line, a second opening exposing a surface of the oxide semiconductor pattern, and a drain electrode disposed on the first opening and a drain electrode pad, the drain electrode extending from the first opening to the second opening and electrically connecting the drain electrode pad and the oxide semiconductor pattern.
Public/Granted literature
- US20100032664A1 THIN FILM TRANSISTOR SUBSTRATE AND A FABRICATING METHOD THEREOF Public/Granted day:2010-02-11
Information query
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