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US08102512B2 Substrate holding device, exposure apparatus, and device manufacturing method 有权
基板保持装置，曝光装置和装置制造方法

Substrate holding device, exposure apparatus, and device manufacturing method
摘要：
To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PH1) formed on the base material (PHB) for holding the substrate (P), and a second holding portion (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of a processing substrate (P) held by the first holding portion (PH1). The second holding portion (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear surface (Tb) of the plate member (T). On the rear surface (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding portion (PH1) and the plate member (T) held by the second holding portion (PH2).
摘要（中）：

提供一种能够防止液体进入基板的背面侧的基板保持装置。 基板保持装置（PH）设置有基材（PHB），形成在用于保持基板（P）的基材（PHB）上的第一保持部分（PH1），以及形成在第一保持部分 用于通过围绕由第一保持部分（PH1）保持的处理衬底（P）的周围来保持板构件（T）的基底材料（PHB）。 第二保持部（PH2）保持板构件（T），以在板构件（T）的后表面（Tb）侧形成第二空间（32）。 在板状构件（T）的后表面（Tb）上设置吸收构件（100），用于吸收从由第一保持部（T）保持的基板（P）之间的间隙（A）进入的液体（LQ） PH1）和由第二保持部（PH2）保持的板构件（T）。

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