Invention Grant
- Patent Title: Process for producing monosilane
- Patent Title (中): 生产甲硅烷的方法
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Application No.: US12088286Application Date: 2006-06-19
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Publication No.: US08105564B2Publication Date: 2012-01-31
- Inventor: Raymund Sonnenschein , Peter Adler , Yuriy Kasatkin , Adolf Petrik , Leonid Schwarzmann
- Applicant: Raymund Sonnenschein , Peter Adler , Yuriy Kasatkin , Adolf Petrik , Leonid Schwarzmann
- Applicant Address: DE Essen
- Assignee: Evonik Degussa GmbH
- Current Assignee: Evonik Degussa GmbH
- Current Assignee Address: DE Essen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102005046105 20050927
- International Application: PCT/EP2006/063316 WO 20060619
- International Announcement: WO2007/039326 WO 20070412
- Main IPC: B01J8/02
- IPC: B01J8/02 ; C01B33/08 ; C01B33/04

Abstract:
Provided is a plant for the continuous production of monosilane and tetrachlorosilane by catalytic dismutation of trichlorosilane, wherein the plant contains: a countercurrent reactor having a double wall, a catalyst bed containing a catalyst which is located in the countercurrent reactor, a condenser at the top of the countercurrent reactor, a vaporizer unit at the bottom of the countercurrent reactor, a trichlorosilane feed line for the introduction of trichlorosilane into the countercurrent reactor, a heat exchanger, with the trichlorosilane conveyed by line via the heat exchanger and preheated there by a bottom product from the vaporizer unit and, for this purpose, the bottom product is fed by line via the heat exchanger into the double wall at a level in the lower part of the countercurrent reactor and discharged from the double wall at a level in the upper part of the countercurrent reactor, a condensation unit downstream of the condenser, and a distillation column having an outlet for monosilane.
Public/Granted literature
- US20090155156A1 PROCESS FOR PRODUCING MONOSILANE Public/Granted day:2009-06-18
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