Invention Grant
- Patent Title: Trigate transistor having extended metal gate electrode
- Patent Title (中): 用具有扩展金属栅电极的晶体管
-
Application No.: US12317966Application Date: 2008-12-31
-
Publication No.: US08120073B2Publication Date: 2012-02-21
- Inventor: Titash Rakshit , Stephen M. Cea , Jack T Kavalieros , Ravi Pillarisetty
- Applicant: Titash Rakshit , Stephen M. Cea , Jack T Kavalieros , Ravi Pillarisetty
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agent Rahul D. Engineer
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08

Abstract:
A trigate device having an extended metal gate electrode comprises a semiconductor body having a top surface and opposing sidewalls formed on a substrate, an isolation layer formed on the substrate and around the semiconductor body, wherein a portion of the semiconductor body remains exposed above the isolation layer, and a gate stack formed on the top surface and opposing sidewalls of the semiconductor body, wherein the gate stack extends a depth into the isolation layer, thereby causing a bottom surface of the gate stack to be below a top surface of the isolation layer.
Public/Granted literature
- US20100163970A1 Trigate transistor having extended metal gate electrode Public/Granted day:2010-07-01
Information query
IPC分类: