发明授权
- 专利标题: Electroless gold plating method and electronic parts
- 专利标题(中): 化学镀金方法及电子零件
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申请号: US12102536申请日: 2008-04-14
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公开(公告)号: US08124174B2公开(公告)日: 2012-02-28
- 发明人: Seigo Kurosaka , Yukinori Oda , Akira Okada , Ayumi Okubo , Masayuki Kiso
- 申请人: Seigo Kurosaka , Yukinori Oda , Akira Okada , Ayumi Okubo , Masayuki Kiso
- 申请人地址: JP Osaka-Shi, Osaka
- 专利权人: C. Uyemura & Co., Ltd.
- 当前专利权人: C. Uyemura & Co., Ltd.
- 当前专利权人地址: JP Osaka-Shi, Osaka
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2007-107198 20070416
- 主分类号: C23C18/16
- IPC分类号: C23C18/16 ; C23C18/34 ; C23C18/44 ; B05D1/36
摘要:
Part or whole of an electroless gold plating film of a plated film laminate including an electroless nickel plating film, an electroless palladium plating film and an electroless gold plating film is formed by an electroless gold plating using an electroless gold plating bath including a water-soluble gold compound, a complexing agent, formaldehyde and/or a formaldehyde-bisulfite adduct, and an amine compound represented by the following general formula R1—NH—C2H4—NH—R2 or R3—(CH2—NH—C2H4—NH—CH2)n—R4. The method of the invention does not need two types of baths, a flash gold plating bath and a thick gold plating bath for thickening. Gold plating films of different thicknesses suited for solder bonding or wire bonding can be formed using only one type of gold plating bath.
公开/授权文献
- US20080277140A1 ELECTROLESS GOLD PLATING METHOD AND ELECTRONIC PARTS 公开/授权日:2008-11-13
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