发明授权
- 专利标题: Integral metal structure with conductive post portions
- 专利标题(中): 具有导电柱部分的整体金属结构
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申请号: US12321833申请日: 2009-01-26
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公开(公告)号: US08129834B2公开(公告)日: 2012-03-06
- 发明人: Robert O. Conn
- 申请人: Robert O. Conn
- 申请人地址: US NC Research Triangle Park
- 专利权人: Research Triangle Institute
- 当前专利权人: Research Triangle Institute
- 当前专利权人地址: US NC Research Triangle Park
- 代理机构: Imperium Patent Works
- 代理商 T. Lester Wallace; Zheng Jin
- 主分类号: H01L23/482
- IPC分类号: H01L23/482 ; H01L23/49 ; H01L23/492 ; H01L23/367
摘要:
A plurality of FPGA dice is disposed upon a semiconductor substrate. In order to supply the immense power required by the plurality of FPGA dice, power is routed through the semiconductor substrate vertically from thick metal layers and large integral metal structures located on the other side of the semiconductor substrate. Because the semiconductor substrate has a different coefficient of thermal linear expansion than metal layers in contact with the substrate, delamination may occur when the structure is subject to changes in temperature. To prevent delamination of metal layers connected to the semiconductor substrate and in electrical contact with the integral metal structures, the integral metal structures are manufactured with an array of post portions. During changes in temperature, the post portions of the integral metal structures bend and slide relative to metal layers connected to the semiconductor substrate and prevent linear stresses that may otherwise cause delamination.
公开/授权文献
- US20100187665A1 Integral metal structure with conductive post portions 公开/授权日:2010-07-29
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