- 专利标题： Photomask blank, photomask, and methods of manufacturing the same
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申请号： US12394503申请日： 2009-02-27
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公开(公告)号： US08137867B2公开(公告)日： 2012-03-20
- 发明人: Osamu Nozawa
- 申请人： Osamu Nozawa
- 申请人地址： JP Tokyo
- 专利权人： Hoya Corporation
- 当前专利权人： Hoya Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2008-046890 20080227; JP2009-015734 20090127
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F1/08 ; G03F1/14 ; C23C14/08 ; C23C14/18 ; C23C14/34
摘要：
A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface antireflection layer formed on the light-shielding layer and made of a material mainly containing tantalum oxide and further containing argon.
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