发明授权
US08197606B2 Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage medium
失效
基板清洗方法，基板清洗装置，控制程序和计算机可读存储介质
- 专利标题： Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage medium
- 专利标题（中）： 基板清洗方法，基板清洗装置，控制程序和计算机可读存储介质
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申请号： US12707098申请日： 2010-02-17
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公开(公告)号： US08197606B2公开(公告)日： 2012-06-12
- 发明人: Tsukasa Watanabe , Naoki Shindo , Hiroki Ohno , Kenji Sekiguchi
- 申请人： Tsukasa Watanabe , Naoki Shindo , Hiroki Ohno , Kenji Sekiguchi
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Abelman, Frayne & Schwab
- 优先权： JP2009-035462 20090218
- 主分类号： B08B7/02
- IPC分类号： B08B7/02
摘要：
Disclosed is a substrate cleaning method for prevent damage to a pattern formed on a substrate. The substrate cleaning method includes cleaning the substrate by striking cleaning particulates carried in a flow of dry air or inert gas against a surface of the substrate, and removing the cleaning particulates.
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