发明授权
- 专利标题: Single polysilicon layer non-volatile memory and operating method thereof
- 专利标题(中): 单晶硅层非易失性存储器及其操作方法
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申请号: US12792746申请日: 2010-06-03
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公开(公告)号: US08199578B2公开(公告)日: 2012-06-12
- 发明人: Hsin-Ming Chen , Shih-Chen Wang , Wen-Hao Ching , Yen-Hsin Lai , Ching-Sung Yang
- 申请人: Hsin-Ming Chen , Shih-Chen Wang , Wen-Hao Ching , Yen-Hsin Lai , Ching-Sung Yang
- 申请人地址: TW Hsinchu
- 专利权人: eMemory Technology Inc.
- 当前专利权人: eMemory Technology Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Jianq Chyun IP Office
- 主分类号: G11C16/04
- IPC分类号: G11C16/04 ; H01L29/788
摘要:
A single-polysilicon layer non-volatile memory having a floating gate transistor, a program gate and a control gate is provided. The floating gate transistor has a floating gate and a tunneling dielectric layer. The floating gate is disposed on a substrate. The tunneling dielectric layer is disposed between the floating gate and the substrate. The program gate, the control gate and the erase gate are respectively disposed in the substrate under the floating gate separated by the tunneling dielectric layer. Therefore, during a program operation and an erase operation, charges are injected in and expelled out through different regions of the tunneling dielectric layer, so as to increase reliability of the non-volatile memory.
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