发明授权
- 专利标题: Light emitting device and method of manufacturing the same
- 专利标题(中): 发光元件及其制造方法
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申请号: US12957908申请日: 2010-12-01
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公开(公告)号: US08217407B2公开(公告)日: 2012-07-10
- 发明人: Yoshiaki Watanabe , Tomonori Hino , Nobukata Okano , Hisayoshi Kuramochi , Yuichiro Kikuchi , Tatsuo Ohashi
- 申请人: Yoshiaki Watanabe , Tomonori Hino , Nobukata Okano , Hisayoshi Kuramochi , Yuichiro Kikuchi , Tatsuo Ohashi
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: SNR Denton US LLP
- 优先权: JP2006-284051 20061018
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method of manufacturing a light emitting device, including the steps of: (A) sequentially forming a first compound semiconductor layer of a first conduction type, an active layer, and a second compound semiconductor layer of a second conduction type different from said first conduction type, over a substrate; and (B) exposing a part of said first compound semiconductor layer, forming a first electrode over said exposed part of said first compound semiconductor layer and forming a second electrode over said second compound semiconductor layer, wherein said method further includes, subsequent to said step (B), the step of: (C) covering at least said exposed part of said first compound semiconductor layer, an exposed part of said active layer, an exposed part of said second compound semiconductor layer, and a part of said second electrode with an SOG layer.
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