发明授权
US08247165B2 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
有权
用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法
- 专利标题： Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
- 专利标题（中）： 用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法
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申请号： US10586187申请日： 2005-01-14
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公开(公告)号： US08247165B2公开(公告)日： 2012-08-21
- 发明人: Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
- 申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
- 申请人地址： JP Tokyo
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 优先权： JP2004-008466 20040115; JP2004-185706 20040624; JP2004-233463 20040810
- 国际申请： PCT/JP2005/000346 WO 20050114
- 国际公布： WO2005/069076 WO 20050728
- 主分类号： G03C1/00
- IPC分类号： G03C1/00 ; G03F7/00 ; C08F18/20
摘要：
An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.