Invention Grant
- Patent Title: Circuit substrate and manufacturing method thereof
- Patent Title (中): 电路基板及其制造方法
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Application No.: US12718226Application Date: 2010-03-05
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Publication No.: US08247705B2Publication Date: 2012-08-21
- Inventor: Tzyy-Jang Tseng , Chang-Ming Lee , Wen-Fang Liu , Cheng-Po Yu
- Applicant: Tzyy-Jang Tseng , Chang-Ming Lee , Wen-Fang Liu , Cheng-Po Yu
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: J.C. Patents
- Priority: TW98146204A 20091231
- Main IPC: H05K1/11
- IPC: H05K1/11

Abstract:
A manufacturing method of a circuit substrate includes the following steps. A dielectric layer is formed on at least one surface of a substrate. An insulating layer is formed on the dielectric layer. A portion of the insulating layer and a portion of the dielectric layer are removed, so as to form at least one blind via in the dielectric layer and the insulating layer. An electroless plating layer is formed on the sidewall of the blind via and a remaining portion of the insulating layer, wherein the binding strength between the insulating layer and the electroless plating layer is greater than that between the dielectric layer and the electroless plating layer. A patterned conductive layer is plated to cover the electroless plating layer.
Public/Granted literature
- US20110155427A1 CIRCUIT SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-06-30
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