发明授权
- 专利标题： Lithographic apparatus and calibration method
- 专利标题（中）： 平版印刷设备和校准方法
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申请号： US12367193申请日： 2009-02-06
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公开(公告)号： US08248583B2公开(公告)日： 2012-08-21
- 发明人: Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
- 申请人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
公开/授权文献
- US20100007867A1 Lithographic Apparatus and Calibration Method 公开/授权日：2010-01-14