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公开(公告)号：US08248583B2
公开(公告)日：2012-08-21
申请号：US12367193
申请日：2009-02-06
申请人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
发明人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70775 , G03F7/70516
摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
摘要翻译： 在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。 舞台的位置由舞台控制器控制。 记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。 舞台系统根据代表差异的注册信号进行校准。
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公开(公告)号：US08514365B2
公开(公告)日：2013-08-20
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或使排水管内的气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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公开(公告)号：USRE43576E1
公开(公告)日：2012-08-14
申请号：US12318821
申请日：2009-01-08
CPC分类号： G03F7/70733 , G03F7/70341
摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
摘要翻译： 本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。 联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间 由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。
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公开(公告)号：US07161659B2
公开(公告)日：2007-01-09
申请号：US11135655
申请日：2005-05-24
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/70725
摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
摘要翻译： 本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。 联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间 由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。
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公开(公告)号：USRE44446E1
公开(公告)日：2013-08-20
申请号：US13584522
申请日：2012-08-13
CPC分类号： G03F7/70733 , G03F7/70341
摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
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公开(公告)号：US07046331B2
公开(公告)日：2006-05-16
申请号：US10407944
申请日：2003-04-07
CPC分类号： G03F7/70633 , G03F7/70733 , Y10T428/24802 , Y10T428/24835
摘要： A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a respective one of the substrate holders. A controller ensures that either the substrate is processed on the appropriate holder or that correction is applied to the imaging. In an alternate embodiment, the substrate is associated with a respective one of the substrate holders and is consistently processed using that substrate holder without further identification steps.
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7.发明授权Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus 失效平版印刷装置，对准装置，装置制造方法以及转换装置的方法公开(公告)号：US07589818B2
公开(公告)日：2009-09-15
申请号：US10743266
申请日：2003-12-23
CPC分类号： G03F7/70341 , B41C1/1075 , B41C1/1083 , G03F7/70258 , G03F9/7026
摘要： A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.
摘要翻译： 检测器检测投影光束或对准光束的路径中的液体。 然后，控制器确定在投影光束或对准光束的光路中可以设置多个补偿光学元件中的哪一个或多个，以便将投影光束或对准光束聚焦在基板的表面上。 可以将适当的光学元件直接放置在投影光束或对准光束的路径中，作为投影系统或对准系统的最终元件。
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公开(公告)号：US20080297744A1
公开(公告)日：2008-12-04
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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9.发明申请LITHOGRAPHIC APPARATUS, ALIGNMENT APPARATUS, DEVICE MANUFACTURING METHOD, AND A METHOD OF CONVERTING AN APPARATUS 审中-公开平面设备，对准设备，设备制造方法和转换设备的方法公开(公告)号：US20090296061A1
公开(公告)日：2009-12-03
申请号：US12537536
申请日：2009-08-07
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , B41C1/1075 , B41C1/1083 , G03F7/70258 , G03F9/7026
摘要： A detector detects liquid in the path of a projection beam or alignment beam. A controller then determines which one or more of a plurality of compensating optical elements may be provided in the optical path of the projection beam or alignment beam in order to focus the projection beam or alignment beam on the surface of the substrate. The appropriate optical element may be placed in the path of the projection beam or alignment beam directly as a final element of the projection system or alignment system respectively.
摘要翻译： 检测器检测投影光束或对准光束的路径中的液体。 然后，控制器确定在投影光束或对准光束的光路中可以设置多个补偿光学元件中的哪一个或多个，以便将投影光束或对准光束聚焦在基板的表面上。 可以将适当的光学元件直接放置在投影光束或对准光束的路径中，作为投影系统或对准系统的最终元件。
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