Invention Grant
- Patent Title: Immersion lithographic apparatus and device manufacturing method
- Patent Title (中): 浸没式光刻设备及器件制造方法
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Application No.: US12408392Application Date: 2009-03-20
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Publication No.: US08259283B2Publication Date: 2012-09-04
- Inventor: Daniël Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
- Applicant: Daniël Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
Public/Granted literature
- US20090237632A1 IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-09-24
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