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公开(公告)号：US08259283B2
公开(公告)日：2012-09-04
申请号：US12408392
申请日：2009-03-20
申请人： Daniël Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
发明人： Daniël Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。
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公开(公告)号：US20090237632A1
公开(公告)日：2009-09-24
申请号：US12408392
申请日：2009-03-20
申请人： Daniel Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
发明人： Daniel Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。
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3.发明授权Fluid handling structure, lithographic apparatus and a device manufacturing method 有权流体处理结构，光刻设备和器件制造方法公开(公告)号：US08638417B2
公开(公告)日：2014-01-28
申请号：US13085069
申请日：2011-04-12
申请人： Danny Maria Hubertus Philips , Daniel Jozef Maria Direcks , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Marcus Johannes Van Der Zanden , Pieter Mulder
发明人： Danny Maria Hubertus Philips , Daniel Jozef Maria Direcks , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Marcus Johannes Van Der Zanden , Pieter Mulder
CPC分类号： G03F7/70341 , Y10T137/86292
摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.
摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中。 流体处理结构的下表面具有供给开口，其构造成朝向相对表面供应流体;多个提取开口，其构造成从流体处理结构和相对表面之间移除流体;以及在供给开口和提取物之间的突起 开口
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公开(公告)号：US09036127B2
公开(公告)日：2015-05-19
申请号：US12423528
申请日：2009-04-14
申请人： Clemens Johannes Gerardus Van den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
发明人： Clemens Johannes Gerardus Van den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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5.发明申请IMMERSION LITHOGRAPHIC APPARATUS, DRYING DEVICE, IMMERSION METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD 有权倾斜平面设备，干燥装置，浸入式计量装置和装置制造方法公开(公告)号：US20090279063A1
公开(公告)日：2009-11-12
申请号：US12437466
申请日：2009-05-07
申请人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
发明人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341 , G03F7/70916
摘要： An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
摘要翻译： 描述了一种浸没式光刻设备，其中液体去除装置被布置成从基板除去液体，例如， 在曝光期间，通过沿着一条线布置并与该线成角度的多个细长槽。 液体移除装置可以用作浸没罩中的弯月面钉扎装置，或者可以用于干燥装置中以从基底去除液滴。
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6.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权流体处理结构，平面设备和设备制造方法公开(公告)号：US20100085545A1
公开(公告)日：2010-04-08
申请号：US12506565
申请日：2009-07-21
申请人： Daniel Jozef Maria DIRECKS , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
发明人： Daniel Jozef Maria DIRECKS , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70991
摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。
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7.发明授权Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method 有权浸渍光刻设备，干燥装置，沉浸式计量装置及装置制造方法公开(公告)号：US08345218B2
公开(公告)日：2013-01-01
申请号：US12437466
申请日：2009-05-07
申请人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
发明人： Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341 , G03F7/70916
摘要： An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
摘要翻译： 描述了一种浸没式光刻设备，其中液体去除装置被布置成从基板除去液体，例如， 在曝光期间，通过沿着一条线布置并与该线成角度的多个细长槽。 液体移除装置可以用作浸没罩中的弯月面钉扎装置，或者可以用于干燥装置中以从基底去除液滴。
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8.发明授权Fluid handling structure, lithographic apparatus and device manufacturing method 有权流体处理结构，光刻设备和器件制造方法公开(公告)号：US09383654B2
公开(公告)日：2016-07-05
申请号：US12506565
申请日：2009-07-21
申请人： Daniel Jozef Maria Direcks , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
发明人： Daniel Jozef Maria Direcks , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
CPC分类号： G03F7/70341 , G03F7/70991
摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。
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9.发明授权Fluid handling structure, lithographic apparatus and device manufacturing method 失效流体处理结构，光刻设备和器件制造方法公开(公告)号：US08508712B2
公开(公告)日：2013-08-13
申请号：US12582919
申请日：2009-10-21
申请人： Clemens Johannes Gerardus Van Den Dungen , Danny Maria Hubertus Philips , Koen Steffens , Tijmen Wilfred Mathijs Gunther , David Bessems
发明人： Clemens Johannes Gerardus Van Den Dungen , Danny Maria Hubertus Philips , Koen Steffens , Tijmen Wilfred Mathijs Gunther , David Bessems
CPC分类号： G03F7/70341
摘要： A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
摘要翻译： 公开了一种流体处理结构和光刻设备，其中采取措施，特别是针对流体处理结构的底表面中的开口阵列的尺寸和间距来处理和/或防止在浸没液体中形成气泡 。
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10.发明授权Fluid handling structure, lithographic apparatus and device manufacturing method 有权流体处理结构，光刻设备和器件制造方法公开(公告)号：US08421993B2
公开(公告)日：2013-04-16
申请号：US12437433
申请日：2009-05-07
申请人： Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Koen Steffens , Arnold Jan Van Putten
发明人： Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Koen Steffens , Arnold Jan Van Putten
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
摘要翻译： 公开了一种流体处理结构，其中指定了流体提取开口的尺寸和布置，以便减少由于两相抽取而被传送到流体处理结构的振动。 可以控制每个流体提取开口的面积和/或所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 振动的减少增加了曝光的准确性。
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