Invention Grant
- Patent Title: Sample processing and observing method
- Patent Title (中): 样品处理和观察方法
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Application No.: US13065238Application Date: 2011-03-17
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Publication No.: US08274049B2Publication Date: 2012-09-25
- Inventor: Keiichi Tanaka , Yo Yamamoto , Xin Man , Junichi Tashiro , Toshiaki Fujii
- Applicant: Keiichi Tanaka , Yo Yamamoto , Xin Man , Junichi Tashiro , Toshiaki Fujii
- Applicant Address: JP
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2010-063337 20100318
- Main IPC: H01L21/66
- IPC: H01L21/66
Abstract:
There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.
Public/Granted literature
- US20110226948A1 Sample processing and observing method Public/Granted day:2011-09-22
Information query
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