Composite charged particle beam apparatus
    3.
    发明授权
    Composite charged particle beam apparatus 有权
    复合带电粒子束装置

    公开(公告)号:US09214316B2

    公开(公告)日:2015-12-15

    申请号:US13622023

    申请日:2012-09-18

    摘要: A composite charged particle beam apparatus comprises an FIB column having an ion beam irradiation axis and an SEM column having an electron beam irradiation axis, the FIB and SEM columns being arranged relative to one another so that the beam irradition axes intersect with each other substantially at a right angle. A sample stage is provided for mounting a sample, and a detector detects secondary particles generated from the sample when irradiated with the ion beam or the electron beam. An observation image formation portion forms an FIB image and an SEM image based on a detection signal of the detector. A display portion displays the FIB image and the SEM image in which a horizontal direction of the sample in the FIB image and said horizontal direction of the sample in the SEM image are the same thereby making it possible for an operator to easily comprehend the positional relationship of the observation image of the sample.

    摘要翻译: 复合带电粒子束装置包括具有离子束照射轴的FIB柱和具有电子束照射轴的SEM柱,FIB和SEM列相对于彼此布置,使得束辐照轴基本上彼此相交 一个直角 提供了用于安装样品的样品台,并且当用离子束或电子束照射时,检测器检测从样品产生的二次颗粒。 观察图像形成部基于检测器的检测信号,形成FIB图像和SEM图像。 显示部显示FIB图像中的样本的水平方向和SEM图像中的样本的水平方向相同的FIB图像和SEM图像,由此能够使操作者容易地理解位置关系 的样品的观察图像。

    Composite charged-particle beam system
    4.
    发明授权
    Composite charged-particle beam system 有权
    复合带电粒子束系统

    公开(公告)号:US07718981B2

    公开(公告)日:2010-05-18

    申请号:US12134919

    申请日:2008-06-06

    IPC分类号: G01N23/00

    摘要: There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel 1, an SEM lens-barrel 2, a gas ion beam lens-barrel 3, and a rotary sample stage 9 having an eucentric tilt mechanism and a rotating shaft 10 orthogonal to an eucentric tilt axis 8. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam 4, an electron beam 5 and a gas ion beam 6 intersect at a single point, an axis of the FIB lens-barrel 1 and an axis of the SEM lens barrel 2 are orthogonal to the eucentric tilt axis 8, respectively, and the axis of the FIB lens-barrel 1, an axis of the gas ion beam lens-barrel 3 and the eucentric tilt axis 8 are in one plane.

    摘要翻译: 提供了一种作为复合带电粒子束系统布置气体离子束装置,FIB和SEM以便有效地制备TEM样品的方法。 复合带电粒子束系统包括FIB透镜镜筒1,SEM透镜镜筒2,气体离子束透镜镜筒3以及具有偏心倾斜机构的旋转样品台9和与其垂直的旋转轴10 在复合带电粒子束系统中,使得聚焦离子束4,电子束5和气体离子束6在单点相交,FIB透镜镜筒的轴线 1并且SEM透镜镜筒2的轴线分别与偏心倾斜轴8正交,并且FIB透镜镜筒1的轴线,气体离子束透镜镜筒3的轴线和偏心倾斜轴线8是 在一架飞机上

    Charged particle beam apparatus
    5.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US20070045560A1

    公开(公告)日:2007-03-01

    申请号:US11509520

    申请日:2006-08-24

    IPC分类号: H01J37/20 G01N1/28

    摘要: To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译: 为了包括聚焦离子束装置,通过加工试样和观察切片试样来制造切片样品,观察切片试样的扫描电子显微镜,气相离子束照射装置,通过将气体离子束照射到 切片试样的表面,切片试样固定并具有至少一个以上的旋转轴的试样台,识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台,以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

    Processing apparatus using focused charged particle beam
    6.
    发明授权
    Processing apparatus using focused charged particle beam 有权
    使用聚焦带电粒子束的处理装置

    公开(公告)号:US07518125B2

    公开(公告)日:2009-04-14

    申请号:US11501629

    申请日:2006-08-09

    IPC分类号: G01N23/00

    CPC分类号: G01N1/32

    摘要: A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independent of the micro sample stage and, due to its small size, can be cooled rapidly by the cooling unit.

    摘要翻译: 处理装置使用聚焦带电粒子束来处理支撑在微安装部件上的微样品。 微型安装部分支撑在微量样品台上,并由冷却单元局部冷却。 微型安装部件与微型样品台热独立,并且由于其小尺寸,可以通过冷却单元快速冷却。

    Processing apparatus using focused charged particle beam
    7.
    发明申请
    Processing apparatus using focused charged particle beam 有权
    使用聚焦带电粒子束的处理装置

    公开(公告)号:US20070040128A1

    公开(公告)日:2007-02-22

    申请号:US11501629

    申请日:2006-08-09

    IPC分类号: H01J37/20

    CPC分类号: G01N1/32

    摘要: A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.

    摘要翻译: 用聚焦带电粒子束观察或加工的样品形成较小,并且只有微样品局部冷却。 或者,使用具有可以放松热漂移的结构的样品安装部件。

    Charged particle beam apparatus
    8.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US07442942B2

    公开(公告)日:2008-10-28

    申请号:US11509520

    申请日:2006-08-24

    IPC分类号: H01J37/20

    摘要: To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译: 为了包括聚焦离子束装置,通过加工试样和观察切片试样来制造切片样品,观察切片试样的扫描电子显微镜,气相离子束照射装置,通过将气体离子束照射到 切片试样的表面,切片试样固定并具有至少一个以上的旋转轴的试样台,识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台,以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。