发明授权
- 专利标题： Method for removing contamination on optical surfaces and optical arrangement
- 专利标题（中）： 消除光学表面污染和光学布置的方法
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申请号： US12469546申请日： 2009-05-20
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公开(公告)号： US08279397B2公开(公告)日： 2012-10-02
- 发明人: Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Vadim Banine , Vladimir Vitalevitsch Ivanov
- 申请人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Vadim Banine , Vladimir Vitalevitsch Ivanov
- 申请人地址： DE Oberkochen NL Veldhoven
- 专利权人： Carl Zeiss SMT GmbH,ASML Netherlands B.V.
- 当前专利权人： Carl Zeiss SMT GmbH,ASML Netherlands B.V.
- 当前专利权人地址： DE Oberkochen NL Veldhoven
- 代理商 Walter Ottesen
- 优先权： DE102006054726 20061121
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.