公开(公告)号：US08279397B2

公开(公告)日：2012-10-02

申请号：US12469546

申请日：2009-05-20

申请人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Vadim Banine ,  Vladimir Vitalevitsch Ivanov

发明人： Dirk Heinrich Ehm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Vadim Banine ,  Vladimir Vitalevitsch Ivanov

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70925

摘要： A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.

摘要翻译： 一种用于去除在光学装置的真空环境中布置的光学表面（26）上的污染的方法和光学装置，优选在用于EUV光刻的投影曝光装置（1）中。 该方法包括在真空环境中产生含有分子氢（18）和至少一种惰性气体（17）的残余气体气氛，通过惰性气体（17）的电离产生惰性气体离子（21），优选用EUV辐射 20），并且通过加热惰性气体离子（21）在残留气体气氛中产生原子氢（27），以除去污染物。

公开(公告)号：US20070146659A1

公开(公告)日：2007-06-28

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20070018118A1

公开(公告)日：2007-01-25

申请号：US11481252

申请日：2006-07-06

申请人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Verpalen ,  Antonius Van De Pas ,  Paul Peter Anna Brom

发明人： Leonid Sjmaenok ,  Vadim Banine ,  Josephus Smits ,  Lambertus Wildenberg ,  Alexander Schmidt ,  Arnoud Wassink ,  Eric Verpalen ,  Antonius Van De Pas ,  Paul Peter Anna Brom

IPC分类号： A61N5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

摘要翻译： 光刻设备包括包括用于产生辐射束的辐射源的辐射系统和布置在辐射束的路径中的污染物阱。 污染物捕集器包括限定通道的多个箔或板，其基本上平行于所述辐射束的传播方向布置。 箔或板可以相对于辐射束的光轴基本上径向定向。 污染物阱可以设置有气体注射器，其被配置为至少在两个不同位置将气体喷射到污染物阱的至少一个通道中。

公开(公告)号：US20070001126A1

公开(公告)日：2007-01-04

申请号：US11170788

申请日：2005-06-30

申请人： Robert Gayazov ,  Vadim Banine ,  Vladimir Ivanov ,  Evgenii Korob ,  Konstantin Koshelev ,  Givi Zukavishvili ,  Yurii Sidelnikov

发明人： Robert Gayazov ,  Vadim Banine ,  Vladimir Ivanov ,  Evgenii Korob ,  Konstantin Koshelev ,  Givi Zukavishvili ,  Yurii Sidelnikov

IPC分类号： A61N5/00

CPC分类号： G03F7/70916

摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.

摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。

公开(公告)号：US20050253092A1

公开(公告)日：2005-11-17

申请号：US11187860

申请日：2005-07-25

申请人： Givi Zukavishvili ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Evgenil Korob ,  Vadim Banine ,  Pavel Antsiferov

发明人： Givi Zukavishvili ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Evgenil Korob ,  Vadim Banine ,  Pavel Antsiferov

IPC分类号： G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24 ,  G03C5/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

摘要： A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.

公开(公告)号：US20050140957A1

公开(公告)日：2005-06-30

申请号：US10748849

申请日：2003-12-31

申请人： Cornelis Petrus Luijkx ,  Vadim Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Eurlings ,  Heine Mulder ,  Johannes Hendrik Everhardus Muijderman ,  Cornelis Van Duijn ,  Jan Krikke

发明人： Cornelis Petrus Luijkx ,  Vadim Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Eurlings ,  Heine Mulder ,  Johannes Hendrik Everhardus Muijderman ,  Cornelis Van Duijn ,  Jan Krikke

IPC分类号： G02B26/02 ,  G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

摘要翻译： 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

公开(公告)号：US20050139785A1

公开(公告)日：2005-06-30

申请号：US10747613

申请日：2003-12-30

申请人： Vadim Banine ,  Johannes De Kuster ,  Johannes Moors ,  Frank Schuurmans ,  Lucas Stevens

发明人： Vadim Banine ,  Johannes De Kuster ,  Johannes Moors ,  Frank Schuurmans ,  Lucas Stevens

IPC分类号： G03F7/20

CPC分类号： G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

公开(公告)号：US20050121624A1

公开(公告)日：2005-06-09

申请号：US10727035

申请日：2003-12-04

申请人： Vladimir Ivanov ,  Vadim Banine ,  Konstantin Koshelev

发明人： Vladimir Ivanov ,  Vadim Banine ,  Konstantin Koshelev

IPC分类号： G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H05G2/00 ,  G03C5/16

CPC分类号： G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.

摘要翻译： 公开了一种光刻设备。 光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。 作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。 辐射采集系统被布置成收集与收集方向辐射的极微紫外辐射，其与颗粒运动方向基本上不同。

公开(公告)号：US20070138414A1

公开(公告)日：2007-06-21

申请号：US11311624

申请日：2005-12-20

申请人： Lucas Stevens ,  Vadim Banine ,  Johannes Moors ,  Bastiaan Wolschrijn

发明人： Lucas Stevens ,  Vadim Banine ,  Johannes Moors ,  Bastiaan Wolschrijn

IPC分类号： G01J3/10

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

摘要翻译： 公开了一种光刻设备。 该装置包括被配置为将第一辐射束投射到基板的目标部分上的投影系统，以及用于检测内部空间中的污染的至少一个监视装置。 监测装置包括至少一个具有至少一个污染物接收表面的虚拟元件。 在本发明的一个方面中，提供了至少一个虚拟元件，其不参与将辐射束传送到基板的目标部分上，其中监视虚设元件的污染物接收表面是否已被污染。

公开(公告)号：US20070069162A1

公开(公告)日：2007-03-29

申请号：US11527728

申请日：2006-09-27

申请人： Vadim Banine ,  Vladimir Ivanov ,  Josephus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Den Wildenberg ,  Vladimir Krivtsun ,  Alexander Struycken ,  Carolus Ida Antonius Spee ,  Klaas Timmer ,  Johannes Ridder

发明人： Vadim Banine ,  Vladimir Ivanov ,  Josephus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Den Wildenberg ,  Vladimir Krivtsun ,  Alexander Struycken ,  Carolus Ida Antonius Spee ,  Klaas Timmer ,  Johannes Ridder

IPC分类号： G01J3/10

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。