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1.发明授权公开(公告)号：US08279397B2
公开(公告)日：2012-10-02
申请号：US12469546
申请日：2009-05-20
申请人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Vadim Banine , Vladimir Vitalevitsch Ivanov
发明人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Vadim Banine , Vladimir Vitalevitsch Ivanov
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/70925
摘要： A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.
摘要翻译： 一种用于去除在光学装置的真空环境中布置的光学表面（26）上的污染的方法和光学装置，优选在用于EUV光刻的投影曝光装置（1）中。 该方法包括在真空环境中产生含有分子氢（18）和至少一种惰性气体（17）的残余气体气氛，通过惰性气体（17）的电离产生惰性气体离子（21），优选用EUV辐射 20），并且通过加热惰性气体离子（21）在残留气体气氛中产生原子氢（27），以除去污染物。
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2.发明申请LITHOGRAPHIC APPARATUS COMPRISING AN INTERNAL SENSOR AND A MINI-REACTOR, AND METHOD FOR TREATING A SENSING SURFACE OF THE INTERNAL SENSOR 有权包含内部传感器和微型反应器的平面设备以及用于处理内部传感器的感测表面的方法公开(公告)号：US20110037961A1
公开(公告)日：2011-02-17
申请号：US12937498
申请日：2009-04-15
IPC分类号： G03B27/42
CPC分类号： G03F7/70933 , G03F7/70925 , G03F7/70975
摘要： A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface.
摘要翻译： 光刻设备包括投影系统，该投影系统构造和布置成将辐射束投影到基板的目标部分上，具有感测表面的内部传感器和相对于传感器可移动的微型反应堆。 微型反应器包括用于含氢气体的入口，氢根发生器和用于含氢自由基气体的出口。 微型反应器被构造和布置成产生包含氢自由基的局部微环境以处理感测表面。
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3.发明申请Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor 有权用于从光学表面除去污染层的方法及其设置方法以及用于产生清洁气体的方法及其装置公开(公告)号：US20100288302A1
公开(公告)日：2010-11-18
申请号：US12662840
申请日：2010-05-06
申请人： Dirk Heinrich Ehm , Arnold Storm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Thomas Stein , Edwin te Sligte
发明人： Dirk Heinrich Ehm , Arnold Storm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Thomas Stein , Edwin te Sligte
CPC分类号： B08B5/02 , B08B7/00 , G03F7/70925
摘要： The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.
摘要翻译： 本发明涉及通过使清洁气体与污染层接触来至少部分地从EUV反射型光学元件（14）的光学表面（14a）去除污染物层（15）的方法。 在该方法中，将清洁气体的喷嘴（20）引导到污染层（15），以从污染层（15）去除材料。 监测污染层（15）以产生指示污染层（15）的厚度的信号，并且通过相对于光学表面移动清洁气体的喷嘴（20）来控制清洁气体的喷射（20） 14a）使用该信号作为反馈信号。 还公开了一种用于执行该方法的清洁装置（19至24）。 本发明还涉及一种用于产生清洁气体的喷嘴（20）和相应的清洁气体产生装置的方法。
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公开(公告)号：US07671347B2
公开(公告)日：2010-03-02
申请号：US11544931
申请日：2006-10-10
申请人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
发明人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
IPC分类号： G21K5/00
CPC分类号： G03F7/70925
摘要： A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.
摘要翻译： 一种清洁装置的光学元件的方法，该装置被配置为将辐射束投影到基板的目标部分上，该装置包括依次布置在辐射束的路径中的多个光学元件，其中清洁 方法包括：清洁序列的一个或多个第二光学元件，其在装置的操作期间接收一个或多个相对较低的第二辐射剂量，利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量，第二辐射剂量低于每个相对高的第一辐射剂量。
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5.发明申请OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HEATED OPTICAL ELEMENT, OPERATING METHODS, AND METHODS FOR CLEANING AS WELL AS FOR PROVIDING AN OPTICAL ELEMENT 有权具有至少一个加热光学元件的光学装置和EUV光刻装置，用于清洁以提供光学元件的操作方法和方法公开(公告)号：US20080143981A1
公开(公告)日：2008-06-19
申请号：US11854621
申请日：2007-09-13
申请人： Dirk Heinrich EHM , Annemieke van de Runstraat , Bastiaan Theodoor Wolschrijn , Arnoldus Jan Storm , Thomas Stein , Marco G. H. Meijerink , A. G. Ton M. Bastein , Esther L. J. van Soest-Vercammen , Norbertus Benedictus Koster , Frits G. H. M. Gubbels , Peter J. Oprel , Michiel Nienoord , Michel Riepen , Johannes Hubertus Josephina Moors
发明人： Dirk Heinrich EHM , Annemieke van de Runstraat , Bastiaan Theodoor Wolschrijn , Arnoldus Jan Storm , Thomas Stein , Marco G. H. Meijerink , A. G. Ton M. Bastein , Esther L. J. van Soest-Vercammen , Norbertus Benedictus Koster , Frits G. H. M. Gubbels , Peter J. Oprel , Michiel Nienoord , Michel Riepen , Johannes Hubertus Josephina Moors
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70316 , G03F7/70891 , G03F7/70925 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.
摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。
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公开(公告)号：US08382301B2
公开(公告)日：2013-02-26
申请号：US12403233
申请日：2009-03-12
申请人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
发明人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
摘要： An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
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7.发明授权Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements 有权用于EUV波长范围辐射的光学系统和用于测量EUV反射元件的污染状态的方法公开(公告)号：US07763870B2
公开(公告)日：2010-07-27
申请号：US11855849
申请日：2007-09-14
申请人： Dirk Heinrich Ehm , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn
发明人： Dirk Heinrich Ehm , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn
IPC分类号： H05G2/00
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70941
摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
摘要翻译： 一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品 元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。 光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。
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8.发明授权Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element 有权具有至少一个加热光学元件的光学布置和EUV光刻设备，操作方法和清洁方法以及用于提供光学元件公开(公告)号：US07959310B2
公开(公告)日：2011-06-14
申请号：US11854621
申请日：2007-09-13
申请人： Dirk Heinrich Ehm , Annemieke Van De Runstraat , Bastiaan Theodoor Wolschrijn , Arnoldus Jan Storm , Thomas Stein , Marco G. H. Meijerink , A. G. Ton M. Bastein , Esther L. J. Van Soest-Vercammen , Norbertus Benedictus Koster , Frits G. H. M. Gubbels , Peter J. Oprel , Michiel Nienoord , Michel Riepen , Johannes Hubertus Josephina Moors
发明人： Dirk Heinrich Ehm , Annemieke Van De Runstraat , Bastiaan Theodoor Wolschrijn , Arnoldus Jan Storm , Thomas Stein , Marco G. H. Meijerink , A. G. Ton M. Bastein , Esther L. J. Van Soest-Vercammen , Norbertus Benedictus Koster , Frits G. H. M. Gubbels , Peter J. Oprel , Michiel Nienoord , Michel Riepen , Johannes Hubertus Josephina Moors
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70316 , G03F7/70891 , G03F7/70925 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： An optical arrangement, in particular a projection system, illumination system or beam shaping system for EUV lithography, including at least one optical element that is arranged in a beam path of the optical arrangement and that reflects radiation in the soft X-ray- or EUV wavelength range, wherein at least during operation of the optical arrangement at least one of, preferably each of, the reflective optical elements in the beam path, at least at the optical surface, has an operating temperature of approximately 30° C. or more, preferably of approximately 100° C. or more, particularly preferably of approximately 150° C. or more, and even more preferably of approximately 250° C. or more, and wherein the optical design of the at least one reflective optical element is selected such that its optical characteristics are optimised for operation at the operating temperature. Also presented is a method for providing a reflective optical element with such an optical design.
摘要翻译： 一种用于EUV光刻的光学装置，特别是投影系统，照明系统或光束整形系统，包括布置在光学装置的光束路径中并且反射软X射线或EUV中的辐射的至少一个光学元件 波长范围，其中至少在所述光学装置的操作期间，所述光束路径中至少在所述光学表面处的所述反射光学元件中的至少一个优选地各自具有大约30℃或更高的工作温度， 优选为约100℃以上，特别优选为约150℃以上，甚至更优选为约250℃以上，并且其中选择所述至少一个反射型光学元件的光学设计 其光学特性被优化以在操作温度下操作。 还提出了一种用于提供具有这种光学设计的反射光学元件的方法。
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公开(公告)号：US20080083878A1
公开(公告)日：2008-04-10
申请号：US11544931
申请日：2006-10-10
申请人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
发明人： Dirk Heinrich Ehm , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Marcus Gerhardus Hendrikus Meijerink , Thomas Stein
IPC分类号： G01J1/42
CPC分类号： G03F7/70925
摘要： A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.
摘要翻译： 一种清洁装置的光学元件的方法，该装置被配置为将辐射束投影到基板的目标部分上，该装置包括依次布置在辐射束的路径中的多个光学元件，其中清洁 方法包括：清洁序列的一个或多个第二光学元件，其在装置的操作期间接收一个或多个相对较低的第二辐射剂量，利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量，第二辐射剂量低于每个相对高的第一辐射剂量。
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10.发明授权Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor 有权包括内部传感器和小型反应器的平版印刷设备以及用于处理内部传感器的检测表面的方法公开(公告)号：US08928855B2
公开(公告)日：2015-01-06
申请号：US12937498
申请日：2009-04-15
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70925 , G03F7/70975
摘要： A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a hydrogen radical generator, and an outlet for a hydrogen radical containing gas. The mini-reactor is constructed and arranged to create a local mini-environment comprising hydrogen radicals to treat the sensing surface.
摘要翻译： 光刻设备包括投影系统，该投影系统构造和布置成将辐射束投影到基板的目标部分上，具有感测表面的内部传感器和相对于传感器可移动的微型反应堆。 微型反应器包括用于含氢气体的入口，氢根发生器和用于含氢自由基气体的出口。 微型反应器被构造和布置成产生包含氢自由基的局部微环境以处理感测表面。
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