Invention Grant
- Patent Title: Structure for an on-chip high frequency electro-static discharge device
- Patent Title (中): 一种片上高频静电放电装置的结构
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Application No.: US12144095Application Date: 2008-06-23
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Publication No.: US08279572B2Publication Date: 2012-10-02
- Inventor: Hanyi Ding , Kai D. Feng , Zhong-Xiang He , Xuefeng Liu , Anthony K. Stamper
- Applicant: Hanyi Ding , Kai D. Feng , Zhong-Xiang He , Xuefeng Liu , Anthony K. Stamper
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Anthony J. Canale
- Main IPC: H02H9/02
- IPC: H02H9/02

Abstract:
A design structure for an on-chip high frequency electro-static discharge device is described. In one embodiment, the electro-static discharge structure comprises a first dielectric layer with more than one electrode formed therein. A second dielectric layer with more than one electrode formed therein is located above the first dielectric layer. At least one via connects the more than one electrode in the first dielectric layer with the more than one electrode in the second dielectric layer. A gap is formed through the first dielectric layer and the second dielectric layer, wherein the gap extends between two adjacent electrodes in both the first dielectric layer and the second dielectric layer. A third dielectric layer is disposed over the second dielectric layer, wherein the third dielectric layer hermetically seals the gap to provide electro-static discharge protection on the integrated circuit.
Public/Granted literature
- US20090316314A1 DESIGN STRUCTURE FOR AN ON-CHIP HIGH FREQUENCY ELECTRO-STATIC DISCHARGE DEVICE Public/Granted day:2009-12-24
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