- 专利标题： Photo-mask and wafer image reconstruction
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申请号： US12475361申请日： 2009-05-29
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公开(公告)号： US08280146B2公开(公告)日： 2012-10-02
- 发明人: Moshe E. Preil , Alex N. Hegyi , Daniel S. Abrams
- 申请人： Moshe E. Preil , Alex N. Hegyi , Daniel S. Abrams
- 申请人地址： US CA Palo Alto
- 专利权人： Luminescent Technologies, Inc.
- 当前专利权人： Luminescent Technologies, Inc.
- 当前专利权人地址： US CA Palo Alto
- 代理机构： Wilson Sonsini Goodrich & Rosati
- 主分类号： G06K9/36
- IPC分类号： G06K9/36
摘要：
A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
公开/授权文献
- US20100086195A1 Photo-Mask and Wafer Image Reconstruction 公开/授权日：2010-04-08
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