Invention Grant
US08293066B2 Apparatus and methods for transporting and processing substrates 有权
用于运输和处理基板的装置和方法

Apparatus and methods for transporting and processing substrates
Abstract:
There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A key element is the use of a transport chamber along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers and then out of the controlled atmosphere following processing in the processing chambers.
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