Invention Grant
- Patent Title: Nitrogen reactive sputtering of Cu-In-Ga-N for solar cells
- Patent Title (中): 用于太阳能电池的Cu-In-Ga-N的氮反应溅射
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Application No.: US13269713Application Date: 2011-10-10
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Publication No.: US08298849B2Publication Date: 2012-10-30
- Inventor: Guowen Ding , Hien Minh Huu Le , Guizhen Zhang
- Applicant: Guowen Ding , Hien Minh Huu Le , Guizhen Zhang
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Methods for forming Cu—In—Ga—N (CIGN) layers for use in TFPV solar panels are described using reactive PVD deposition in a nitrogen containing atmosphere. In some embodiments, the CIGN layers can be used as an absorber layer and eliminate the need of a selenization step. In some embodiments, the CIGN layers can be used as a protective layer to decrease the sensitivity of the CIG layer to oxygen or moisture before the selenization step. In some embodiments, the CIGN layers can be used as an adhesion layer to improve the adhesion between the back contact layer and the absorber layer.
Public/Granted literature
- US20120196399A1 Nitrogen Reactive Sputtering of Cu-In-Ga-N For Solar Cells Public/Granted day:2012-08-02
Information query
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