发明授权
US08304752B2 EUV light producing system and method utilizing an alignment laser
有权
EUV光产生系统和利用对准激光的方法
- 专利标题: EUV light producing system and method utilizing an alignment laser
- 专利标题(中): EUV光产生系统和利用对准激光的方法
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申请号: US12638413申请日: 2009-12-15
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公开(公告)号: US08304752B2公开(公告)日: 2012-11-06
- 发明人: Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
- 申请人: Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: DiBerardino McGovern IP Group LLC
- 主分类号: G01J1/04
- IPC分类号: G01J1/04 ; G01J1/18
摘要:
A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
公开/授权文献
- US20100327192A1 Alignment Laser 公开/授权日:2010-12-30
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