发明授权
US08339577B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
有权
用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
- 专利标题: Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
- 专利标题(中): 用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
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申请号: US12506364申请日: 2009-07-21
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公开(公告)号: US08339577B2公开(公告)日: 2012-12-25
- 发明人: Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
- 申请人: Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 优先权: DE102007005875 20070206; DE102007036245 20070802
- 主分类号: G01C11/26
- IPC分类号: G01C11/26 ; G01N21/00 ; G03B27/32 ; G03B27/54 ; G03B27/74
摘要:
An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.