公开(公告)号：US09046786B2

公开(公告)日：2015-06-02

申请号：US13604296

申请日：2012-09-05

申请人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

摘要翻译： 微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。 由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。 位移机构改变衍射光学元件的相互空间排列。 在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。 这使得可以以简单的方式生产连续可变的照明设置。

公开(公告)号：US09013684B2

公开(公告)日：2015-04-21

申请号：US13556408

申请日：2012-07-24

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03F7/20 ,  G02B26/08 ,  G01M11/00 ,  G01N21/55

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

摘要翻译： 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US20120002185A1

公开(公告)日：2012-01-05

申请号：US13215616

申请日：2011-08-23

申请人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

发明人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

IPC分类号： G03B27/54

CPC分类号： G03F7/7085 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70266 ,  G03F7/70591 ,  G03F7/706

摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

摘要翻译： 微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。 测量装置包括具有多个照明构件的照明单元，每个具有光出射面。 光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。 检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

公开(公告)号：US20100039629A1

公开(公告)日：2010-02-18

申请号：US12506364

申请日：2009-07-21

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03B27/54

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.

摘要翻译： 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

公开(公告)号：US20090262324A1

公开(公告)日：2009-10-22

申请号：US12464730

申请日：2009-05-12

申请人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

发明人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

IPC分类号： G03B27/80

CPC分类号： G03F7/7085 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The illumination optics (5) further includes a light distribution device (12a) which comprises a light deflection array (12) of separate elements and an optical assembly (21, 23 to 26) which converts the light intensity distribution defined by the light distribution device (12a) in a first plane (19) of the illumination optics (5) into an illumination angle distribution in the reticle plane (6). Downstream of an output coupling device (17), which is arranged in the light path between the light deflection array (12) and the reticle plane (6), a space and time resolving detection device (30) is exposed to outcoupled illumination light (31) in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution in the first plane (19). The detection device (30) allows the influence of separate elements or groups of separate elements on the light intensity distribution in the first plane (19) to be determined, particularly by varying said separate elements or groups of separate elements over time. The result is an illumination optics in which the function of the light deflection array is performed during normal operation.

摘要翻译： 微光刻投影曝光装置（1）包括具有用于照亮标线板平面（6）中的照明场的照明光学器件（5）的照明系统（4）。 照明光学器件（5）还包括配光装置（12a），其包括分离元件的光偏转阵列（12）和光学组件（21,23至26），该光学组件（21,23至26）将由光分配装置 （5）的第一平面（19）中的光线（12a）成为所述掩模版平面（6）中的照明角度分布。 布置在光偏转阵列（12）和光罩平面（6）之间的光路中的输出耦合装置（17）的下游，空间和时间分辨检测装置（30）暴露于外耦合照明光 31），使得检测装置（30）检测对应于第一平面（19）中的光强度分布的光强度分布。 检测装置（30）允许确定分离的元件或单独元件组对第一平面（19）中的光强度分布的影响，特别是通过随时间改变所述单独元件或单独元件组。 结果是在正常操作期间执行光偏转阵列的功能的照明光学器件。

公开(公告)号：US20140233006A1

公开(公告)日：2014-08-21

申请号：US14255302

申请日：2014-04-17

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Manfred Maul ,  Johannes Eisenmenger ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Damian Fiolka ,  Andras G. Major ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Manfred Maul ,  Johannes Eisenmenger ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Damian Fiolka ,  Andras G. Major ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03F7/20 ,  G01N21/55

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

公开(公告)号：US08724086B2

公开(公告)日：2014-05-13

申请号：US12818844

申请日：2010-06-18

申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner σ or an outer σ.

摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于在时间上稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关出射光瞳中的第二调整的强度分布 在内部和外部的至少一个中小于0.1; 或外部的。

公开(公告)号：US20120293784A1

公开(公告)日：2012-11-22

申请号：US13556408

申请日：2012-07-24

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03B27/54

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

摘要翻译： 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US20110304837A1

公开(公告)日：2011-12-15

申请号：US13208472

申请日：2011-08-12

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G03B27/54 ,  G02B5/18 ,  H01S3/13

CPC分类号： G03F7/70583 ,  G02B27/48 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/08009 ,  H01S3/225

摘要： In a projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, laser radiation having a spectral intensity distribution I(ω) dependent on the angular frequency ω is used. The laser radiation is characterized by an aberration parameter α in accordance with: α := ∫ I  ( ω )  ω 2   ω ∫ I  ( ω )   ω and a coherence time τ in accordance with: τ = ∫ I  ( ω ) 2   ω [ ∫ I  ( ω )   ω ] 2 The laser radiation is introduced into an illumination system for generating an illumination radiation directed onto the mask, and the pattern is imaged onto the substrate with the aid of a projection objective. The spectral intensity distribution is set so that ατ2≦0.3. The influence of temporally varying speckles on image generation can be reduced by comparison with conventional methods, without simultaneously increasing the influence of chromatic aberrations on image generation.

摘要翻译： 在投影曝光方法中，通过布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像来布置在投影物镜的图像表面区域中的放射线敏感基板的曝光， 使用具有取决于角频率ω的光谱强度分布I（ω）的激光辐射。 激光辐射的特征在于根据以下的像差参数α：α= =∫I（（））ωω∫∫∫∫ I（？）2∫ω∫∫I（ω）ωωωωωthe the the the the the the the the the the the the the the the the the the the the the the the the the the the the the the the the 协助投影目标。 光谱强度分布被设置为使得ατ2＆nlE; 0.3。 与常规方法相比，可以减少时间上变化的斑点对图像产生的影响，而不会同时增加色差对图像生成的影响。

公开(公告)号：US20100283984A1

公开(公告)日：2010-11-11

申请号：US12818501

申请日：2010-06-18

申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.