Invention Grant
- Patent Title: Vacuum processing apparatus
- Patent Title (中): 真空加工设备
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Application No.: US12578864Application Date: 2009-10-14
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Publication No.: US08349082B2Publication Date: 2013-01-08
- Inventor: Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
- Applicant: Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
- Applicant Address: KR Sungnam-shi
- Assignee: Advanced Display Process Engineering Co., Ltd.
- Current Assignee: Advanced Display Process Engineering Co., Ltd.
- Current Assignee Address: KR Sungnam-shi
- Agency: KED & Associates, LLP
- Priority: KR10-2005-0010481 20050204; KR10-2005-0097621 20051017; KR10-2005-0097625 20051017; KR10-2005-0097642 20051017; KR10-2005-0097646 20051017; KR10-2005-0097652 20051017; KR10-2005-0097664 20051017; KR10-2005-0097667 20051017
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306
Abstract:
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
Public/Granted literature
- US20100086382A1 VACUUM PROCESSING APPARATUS Public/Granted day:2010-04-08
Information query
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