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公开(公告)号：US20100086382A1
公开(公告)日：2010-04-08
申请号：US12578864
申请日：2009-10-14
申请人： Young Jong LEE , Jun Young Choi , Hyoung-Kyu Son , Jeog-bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong LEE , Jun Young Choi , Hyoung-Kyu Son , Jeog-bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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公开(公告)号：US20060191118A1
公开(公告)日：2006-08-31
申请号：US11346621
申请日：2006-02-02
申请人： Young Lee , Jun Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Lee , Jun Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： B23P19/04
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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公开(公告)号：US08506711B2
公开(公告)日：2013-08-13
申请号：US12358752
申请日：2009-01-23
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
IPC分类号： C23C16/44 , C23F1/00 , H01L21/306 , C23C16/22 , C23C16/06
CPC分类号： H01L21/67126 , H01L21/67196 , H01L21/67201 , H01L21/67236 , H01L51/56
摘要： An flat-panel display (FPD) manufacturing apparatus is provided. The apparatus is flexibly configured so that it is capable of easily processing large-size substrates while also simplifying manufacturing, transporting, operating, and repair processes.
摘要翻译： 提供了一种平板显示器（FPD）制造装置。 该装置灵活地构造成能够容易地处理大尺寸基板，同时也简化了制造，运输，操作和修理过程。
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公开(公告)号：US08152926B2
公开(公告)日：2012-04-10
申请号：US12578820
申请日：2009-10-14
申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： C23C16/00 , H01L21/306 , B66C1/00 , B23P19/04
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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公开(公告)号：US20100086381A1
公开(公告)日：2010-04-08
申请号：US12578820
申请日：2009-10-14
申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： H01L21/67
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
摘要翻译： 这里公开了一种真空处理装置，用于在其中建立真空气氛之后对基板进行所需的处理。 更具体地说，真空处理装置包括真空室，其被分成室主体和上盖。 上盖被构造成容易地打开并且关闭到室主体。
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公开(公告)号：US08075691B2
公开(公告)日：2011-12-13
申请号：US12578918
申请日：2009-10-14
申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： C23C16/00 , H01L21/306 , B66C1/00 , B23P19/04
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
摘要翻译： 这里公开了一种真空处理装置，用于在其中建立真空气氛之后对基板进行所需的处理。 更具体地说，真空处理装置包括真空室，其被分成室主体和上盖。 上盖被构造成容易地打开并且关闭到室主体。
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公开(公告)号：US20100089531A1
公开(公告)日：2010-04-15
申请号：US12578796
申请日：2009-10-14
申请人： Young Jong LEE , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong LEE , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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公开(公告)号：US20100086383A1
公开(公告)日：2010-04-08
申请号：US12578918
申请日：2009-10-14
申请人： Young Jong LEE , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
发明人： Young Jong LEE , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
IPC分类号： H01L21/67
CPC分类号： H01L21/67126 , H01L21/6719 , Y10T29/53687
摘要： Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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公开(公告)号：US20090056874A1
公开(公告)日：2009-03-05
申请号：US12143888
申请日：2008-06-23
申请人： Gyeong Hoon KIM , Young Bae Ko
发明人： Gyeong Hoon KIM , Young Bae Ko
CPC分类号： H01J37/32706 , H01J37/32009 , H01J37/32541 , H01J37/3255 , H01L21/67109
摘要： A lower electrode assembly includes an insulator and a lower electrode material. The lower electrode material includes a peripheral portion having three level surfaces. The first level surface supports a substrate having a predetermined width and length. The second level surface has a width that corresponds to the predetermined width of the substrate plus a first increment and a length that correspond to the predetermined length of the substrate plus a second increment. The third level surface has a lower height than the second level surface. The insulator is provided horizontally on the second level surface and third level surface.
摘要翻译： 下电极组件包括绝缘体和下电极材料。 下电极材料包括具有三个水平表面的周边部分。 第一级表面支撑具有预定宽度和长度的衬底。 第二级表面具有对应于衬底的预定宽度的宽度加上与衬底的预定长度相对应的第一增量和长度加上第二增量。 第三级表面具有比第二级表面低的高度。 绝缘体水平地设置在第二水平表面和第三水平面上。
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公开(公告)号：US20050183824A1
公开(公告)日：2005-08-25
申请号：US11064270
申请日：2005-02-23
申请人： Young Lee , Jun Choi , Saeng Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
发明人： Young Lee , Jun Choi , Saeng Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
CPC分类号： H01L21/67126 , H01L21/67196 , H01L21/67201 , H01L21/67236 , H01L51/56
摘要： An flat-panel display (FPD) manufacturing apparatus which has a configuration capable of easily processing large-size substrates while achieving easy manufacturing, transporting, operating, and repair processes.
摘要翻译： 一种平板显示器（FPD）制造装置，其具有能够容易地处理大尺寸基板的构造，同时实现容易的制造，运输，操作和修复过程。
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