Invention Grant
- Patent Title: Non-volatile memory device and method of manufacturing the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US12659516Application Date: 2010-03-11
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Publication No.: US08357992B2Publication Date: 2013-01-22
- Inventor: Ho-jung Kim , In-kyeong Yoo , Chang-jung Kim , Ki-ha Hong
- Applicant: Ho-jung Kim , In-kyeong Yoo , Chang-jung Kim , Ki-ha Hong
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2009-0097737 20091014
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L29/00

Abstract:
The non-volatile memory device may include a substrate, a plurality of first signal lines on the substrate in a vertical direction, a plurality of memory cells having ends connected to the plurality of first signal lines, a plurality of second signal lines perpendicular to the plurality of first signal lines on the substrate and each connected to other ends of the plurality of memory cells, and a plurality of selection elements on the substrate and connected to at least two of the plurality of first signal lines.
Public/Granted literature
- US20110085368A1 Non-volatile memory device and method of manufacturing the same Public/Granted day:2011-04-14
Information query
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