Invention Grant
- Patent Title: Lithographic fabrication of general periodic structures
- Patent Title (中): 一般周期性结构的平版印刷
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Application No.: US12706081Application Date: 2010-02-16
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Publication No.: US08368871B2Publication Date: 2013-02-05
- Inventor: Harun H. Solak , Christian Dais , Francis Clube
- Applicant: Harun H. Solak , Christian Dais , Francis Clube
- Applicant Address: CH Villigen
- Assignee: Eulitha AG
- Current Assignee: Eulitha AG
- Current Assignee Address: CH Villigen
- Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- Main IPC: G03B27/52
- IPC: G03B27/52

Abstract:
A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.
Public/Granted literature
- US20110199598A1 Lithographic fabrication of general periodic structures Public/Granted day:2011-08-18
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