Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
    1.
    发明授权
    Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions 有权
    通过将感光层暴露于一定范围的横向强度分布来平滑地制造一般周期性结构

    公开(公告)号:US09036133B2

    公开(公告)日:2015-05-19

    申请号:US13218657

    申请日:2011-08-26

    Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

    Abstract translation: 与Talbot成像相关的平版印刷方法,用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上,该方法包括提供具有掩模特征图案的掩模,将基片平行放置 靠近掩模,提供具有中心波长和光谱带宽的照明源,从所述源形成具有强度角度分布的照明光束,将衬底距离掩模布置并将掩模图案暴露于所述光束,从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内,其中光束的角分布结合掩模中的特征图案设计, 衬底与掩模的距离。

    Method and apparatus for printing a periodic pattern with a large depth of focus
    2.
    发明申请
    Method and apparatus for printing a periodic pattern with a large depth of focus 有权
    用于打印具有较大焦深的周期性图案的方法和装置

    公开(公告)号:US20120009525A1

    公开(公告)日:2012-01-12

    申请号:US12831337

    申请日:2010-07-07

    CPC classification number: G03F7/70408 G03B27/54 G03F7/70325 G03F7/7035

    Abstract: A method for printing a desired pattern into a photosensitive layer that includes providing a mask bearing a pattern of linear features that are parallel to a first direction, arranging the layer parallel to and separated from said mask, generating substantially monochromatic light, and illuminating the mask pattern with said light over a range of angles of incidence in a plane parallel to said first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer whereby the integration of said components prints the desired pattern, wherein the range of angles is selected so that the integration of said components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.

    Abstract translation: 一种用于将期望图案印刷到感光层中的方法,其包括提供具有平行于第一方向的线性特征图案的掩模,将该层与所述掩模平行并分离,产生基本上单色的光并照射该掩模 在平行于所述第一方向的平面上的入射角范围内的所述光的图案,在正交入射平面中基本上为单一角度,并且由掩模发射的每个入射角的光形成光场 其中所述部件的集成打印出所需的图案,其中选择角度范围使得所述部件的整合基本上等于由Talbot图像平面之间形成的横向强度分布范围的平均值 发生角度之一。

    Method and apparatus for printing a periodic pattern with a large depth of focus
    3.
    发明授权
    Method and apparatus for printing a periodic pattern with a large depth of focus 有权
    用于打印具有较大焦深的周期性图案的方法和装置

    公开(公告)号:US08524443B2

    公开(公告)日:2013-09-03

    申请号:US12831337

    申请日:2010-07-07

    CPC classification number: G03F7/70408 G03B27/54 G03F7/70325 G03F7/7035

    Abstract: A method for printing a desired pattern into a photosensitive layer that includes providing a mask bearing a pattern of linear features that are parallel to a first direction, arranging the layer parallel to and separated from said mask, generating substantially monochromatic light, and illuminating the mask pattern with said light over a range of angles of incidence in a plane parallel to said first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer whereby the integration of said components prints the desired pattern, wherein the range of angles is selected so that the integration of said components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.

    Abstract translation: 一种用于将期望图案印刷到感光层中的方法,其包括提供具有平行于第一方向的线性特征图案的掩模,将该层与所述掩模平行并分离,产生基本上单色的光并照射该掩模 在平行于所述第一方向的平面上的入射角范围内的所述光的图案,在正交入射平面中基本上为单个角度,并且由掩模传播的每个入射角的光形成光场 其中所述部件的集成打印出所需的图案,其中选择角度范围使得所述部件的整合基本上等于由Talbot图像平面之间形成的横向强度分布范围的平均值 发生角度之一。

    Method and apparatus for printing periodic patterns
    4.
    发明授权
    Method and apparatus for printing periodic patterns 有权
    打印周期性图案的方法和装置

    公开(公告)号:US08525973B2

    公开(公告)日:2013-09-03

    申请号:US13035012

    申请日:2011-02-25

    CPC classification number: G03F7/7035 G03F7/70408

    Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time while changing the separation by a distance having a desired value and with a rate of change of separation, wherein at least one of the rate of change of separation and the intensity of light are varied during the change of separation, whereby the mask is illuminated by an energy density per incremental change of separation that varies over said distance.

    Abstract translation: 一种用于印刷特征图案的方法,包括以下步骤:提供具有设置在其上的记录层的基底,提供具有周期性图案特征的掩模,将基底平行于掩模并且具有初始值的分离, 照明系统,用于以单色光的强度照射掩模,以产生用于曝光记录层的透射光场,并且在将分离改变具有期望值和变化率的距离的同时照射曝光时间 的分离,其中在分离改变期间分离变化率和光强度中的至少一个变化,由此每隔增加的分离变化在所述距离上变化的能量密度来照亮面罩。

    Lithographic fabrication of general periodic structures
    5.
    发明授权
    Lithographic fabrication of general periodic structures 有权
    一般周期性结构的平版印刷

    公开(公告)号:US08368871B2

    公开(公告)日:2013-02-05

    申请号:US12706081

    申请日:2010-02-16

    CPC classification number: G03F7/70408 G03B27/58 G03F7/70325 G03F7/7035

    Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

    Abstract translation: 与Talbot成像相关的平版印刷方法,用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上,该方法包括提供具有掩模特征图案的掩模,将基片平行放置 靠近掩模,提供具有中心波长和光谱带宽的照明源,从所述源形成具有强度角度分布的照明光束,将衬底距离掩模布置并将掩模图案暴露于所述光束,从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内,其中光束的角分布结合掩模中的特征图案设计, 衬底与掩模的距离。

    Method and apparatus for printing periodic patterns
    6.
    发明申请
    Method and apparatus for printing periodic patterns 审中-公开
    打印周期性图案的方法和装置

    公开(公告)号:US20120092634A1

    公开(公告)日:2012-04-19

    申请号:US12903389

    申请日:2010-10-13

    CPC classification number: G03F7/70408 G03F7/70325

    Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time whilst changing the separation by a range having a predetermined value and varying at least one of the rate of change of separation and the intensity of illumination so that the mask is illuminated by an energy density per incremental change of separation that varies over said range, whereby the printed pattern has low sensitivity to a deviation of the range from said predetermined value or to the initial value of the separation.

    Abstract translation: 一种用于印刷特征图案的方法,包括以下步骤:提供具有设置在其上的记录层的基底,提供具有周期性图案特征的掩模,将基底平行于掩模并且具有初始值的分离, 照明系统,用于以单色光的强度照射掩模,以产生用于曝光记录层的透射光场,并且在将分离改变具有预定值的范围并且改变至少一个 分离的变化率和照明强度,使得掩模由在每个增量变化的能量密度照亮,其在所述范围上变化,由此印刷图案对于与所述预定值的范围的偏差具有低灵敏度,或 到分离的初始值。

    Lithographic fabrication of general periodic structures
    7.
    发明申请
    Lithographic fabrication of general periodic structures 有权
    一般周期性结构的平版印刷

    公开(公告)号:US20110199598A1

    公开(公告)日:2011-08-18

    申请号:US12706081

    申请日:2010-02-16

    CPC classification number: G03F7/70408 G03B27/58 G03F7/70325 G03F7/7035

    Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

    Abstract translation: 与Talbot成像相关的平版印刷方法,用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上,该方法包括提供具有掩模特征图案的掩模,将基片平行放置 靠近掩模,提供具有中心波长和光谱带宽的照明源,从所述源形成具有强度角度分布的照明光束,将衬底距离掩模布置并将掩模图案暴露于所述光束,从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内,其中光束的角分布结合掩模中的特征图案设计, 衬底与掩模的距离。

    METHOD AND APPARATUS FOR PRINTING PERIODIC PATTERNS USING MULTIPLE LASERS
    8.
    发明申请
    METHOD AND APPARATUS FOR PRINTING PERIODIC PATTERNS USING MULTIPLE LASERS 审中-公开
    使用多个激光打印周期性图案的方法和装置

    公开(公告)号:US20140307242A1

    公开(公告)日:2014-10-16

    申请号:US14123330

    申请日:2012-06-01

    CPC classification number: G03F7/70075 G03F7/70408

    Abstract: A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a mask pattern, providing a substrate bearing the layer, arranging the substrate parallel to the mask, providing a number of lasers having a plurality of peak wavelengths, forming from the light a beam for illuminating the mask with a spectral distribution of exposure dose and a degree of collimation, illuminating the mask with the beam such that the light of each wavelength transmitted by the mask pattern forms a range of transversal intensity distributions between Talbot planes and exposes the photosensitive layer to an image component. The separation and the spectral distribution are arranged so that the superposition of the components is equivalent to an average of the range of transversal intensity distributions formed by light of one wavelength and the collimation is arranged so that the features are resolved.

    Abstract translation: 将特征的周期性图案印刷到感光层中的方法包括提供带有掩模图案的掩模,提供承载该层的基板,将该基板平行于掩模布置,提供多个具有多个峰值波长的激光器,形成 从光照射具有照射剂量的光谱分布和准直程度的光束,用光束照射掩模,使得由掩模图案传输的每个波长的光形成Talbot平面之间的横向强度分布范围 并将感光层暴露于图像分量。 分离和光谱分布被布置成使得部件的叠加等价于由一个波长的光形成的横向强度分布的平均值,并且准直被设置为使得特征被解决。

    Method and apparatus for printing periodic patterns
    9.
    发明申请
    Method and apparatus for printing periodic patterns 有权
    打印周期性图案的方法和装置

    公开(公告)号:US20120092635A1

    公开(公告)日:2012-04-19

    申请号:US13035012

    申请日:2011-02-25

    CPC classification number: G03F7/7035 G03F7/70408

    Abstract: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for illuminating the mask with an intensity of monochromatic light to generate a transmitted light-field for exposing the recording layer, and illuminating the mask for an exposure time whilst changing the separation by a distance having a desired value and with a rate of change of separation, wherein at least one of the rate of change of separation and the intensity of light are varied during the change of separation, whereby the mask is illuminated by an energy density per incremental change of separation that varies over said distance.

    Abstract translation: 一种用于印刷特征图案的方法,包括以下步骤:提供具有设置在其上的记录层的基底,提供具有周期性图案特征的掩模,将基底平行于掩模并且具有初始值的分离, 用于以单色光的强度照亮掩模的照明系统以产生用于曝光记录层的透射光场,并且在将分离改变具有期望值和变化率的距离的同时照射曝光时间 的分离,其中在分离改变期间分离变化率和光强度中的至少一个变化,由此每隔增加的分离变化在所述距离上变化的能量密度来照亮面罩。

    Lithographic fabrication of general periodic structures

    公开(公告)号:US20110310374A1

    公开(公告)日:2011-12-22

    申请号:US13218657

    申请日:2011-08-26

    Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

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