发明授权
US08390058B2 Configurations and methods for manufacturing devices with trench-oxide-nano-tube super-junctions
有权
用于制造具有沟槽氧化物 - 纳米管超结的器件的配置和方法
- 专利标题: Configurations and methods for manufacturing devices with trench-oxide-nano-tube super-junctions
- 专利标题(中): 用于制造具有沟槽氧化物 - 纳米管超结的器件的配置和方法
-
申请号: US12661004申请日: 2010-03-05
-
公开(公告)号: US08390058B2公开(公告)日: 2013-03-05
- 发明人: Hamza Yilmaz , Madhur Bobde , Yeeheng Lee , Lingpeng Guan , Xiaobin Wang , John Chen , Anup Bhalla
- 申请人: Hamza Yilmaz , Madhur Bobde , Yeeheng Lee , Lingpeng Guan , Xiaobin Wang , John Chen , Anup Bhalla
- 申请人地址: US CA Sunnyvale
- 专利权人: Aplha and Omega Semiconductor Incorporated
- 当前专利权人: Aplha and Omega Semiconductor Incorporated
- 当前专利权人地址: US CA Sunnyvale
- 代理商 Bo-In Lin
- 主分类号: H01L29/76
- IPC分类号: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119
摘要:
This invention discloses semiconductor power device disposed on a semiconductor substrate of a first conductivity type. The semiconductor substrate supports an epitaxial layer of a second conductivity type thereon wherein the semiconductor power device is supported on a super-junction structure. The super-junction structure comprises a plurality of trenches opened from a top surface in the epitaxial layer; wherein each of the trenches having trench sidewalls covered with a first epitaxial layer of the first conductivity type to counter charge the epitaxial layer of the second conductivity type. A second epitaxial layer may be grown over the first epitaxial layer. Each of the trenches is filled with a non-doped dielectric material in a remaining trench gap space. Each of the trench sidewalls is opened with a tilted angle to form converging U-shaped trenches.
公开/授权文献
信息查询
IPC分类: