发明授权
US08390058B2 Configurations and methods for manufacturing devices with trench-oxide-nano-tube super-junctions 有权
用于制造具有沟槽氧化物 - 纳米管超结的器件的配置和方法

Configurations and methods for manufacturing devices with trench-oxide-nano-tube super-junctions
摘要:
This invention discloses semiconductor power device disposed on a semiconductor substrate of a first conductivity type. The semiconductor substrate supports an epitaxial layer of a second conductivity type thereon wherein the semiconductor power device is supported on a super-junction structure. The super-junction structure comprises a plurality of trenches opened from a top surface in the epitaxial layer; wherein each of the trenches having trench sidewalls covered with a first epitaxial layer of the first conductivity type to counter charge the epitaxial layer of the second conductivity type. A second epitaxial layer may be grown over the first epitaxial layer. Each of the trenches is filled with a non-doped dielectric material in a remaining trench gap space. Each of the trench sidewalls is opened with a tilted angle to form converging U-shaped trenches.
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