发明授权
- 专利标题： Alignment inspection
- 专利标题（中）： 校准检查
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申请号： US12957169申请日： 2010-11-30
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公开(公告)号： US08399264B2公开(公告)日： 2013-03-19
- 发明人: Zhihua Zou , Liang Zhang , Sheng Li , Tamil Selvamuniandy
- 申请人： Zhihua Zou , Liang Zhang , Sheng Li , Tamil Selvamuniandy
- 申请人地址： US CA Santa Clara
- 专利权人： Intel Corporation
- 当前专利权人： Intel Corporation
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Winkle, PLLC
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/66 ; H01L21/44 ; H01L23/58 ; G01R31/26
摘要：
The present disclosure relates to the field of microelectronic substrate fabrication and, more particularly, to alignment inspection for vias formed in the microelectronic substrates. The alignment inspection may be achieved by determining the relative positions of fluorescing and non-fluorescing elements in a microelectronic substrate.
公开/授权文献
- US20120135546A1 ALIGNMENT INSPECTION 公开/授权日：2012-05-31
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